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1. (WO1991007521) ROTATING CYLINDRICAL MAGNETRON STRUCTURE FOR LARGE AREA COATING
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/007521 International Application No.: PCT/US1990/006451
Publication Date: 30.05.1991 International Filing Date: 07.11.1990
Chapter 2 Demand Filed: 29.04.1991
IPC:
C23C 14/34 (2006.01) ,H01J 37/34 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
Applicants:
THE BOC GROUP, INC. [US/US]; 100 Mountain Avenue Murray Hill New Providence, NJ 07974, US (AllExceptUS)
BOOZENNY, Alex [US/US]; US (UsOnly)
HOOG, Josef, T. [US/US]; US (UsOnly)
Inventors:
BOOZENNY, Alex; US
HOOG, Josef, T.; US
Agent:
PARSONS, Gerald, P.; Majestic, Parsons, Siebert & Hsue Four Embarcadero Center Suite 1450 San Francisco, CA 94111-4121, US
Priority Data:
433,65308.11.1989US
609,81506.11.1990US
Title (EN) ROTATING CYLINDRICAL MAGNETRON STRUCTURE FOR LARGE AREA COATING
(FR) STRUCTURE A MAGNETRON CYLINDRIQUE ROTATIF POUR LE REVETEMENT DE SURFACES DE GRANDES DIMENSIONS
Abstract:
(EN) Mechanisms for supporting, rotating, cooling and energizing a cylindrical magnetron target structure (59, 61) in a through supports (65, 69) at each end of the target structure. Two specific configurations are described. Particular arrangements (72) of magnets are provided within the target cylinder. Two adjacent rotating target cylinders may optionally be employed in order to increase the rate of depositing sputtered material on a substrate. The various features of this invention are particularly adapted for a large-scale cylindrical magnetron used for sputtering coatings on architectural glass panels, automobile windshields and the like, but are also advantageous for use in coating very small substrates.
(FR) Des mécanismes supportent, mettent en rotation, refroidissent et actionnent une structure voulue (59, 61) à magnétron cylindrique agencée sur des supports situés à chaque extrémité de la structure. Deux conceptions spécifiques sont décrites. Des agencements particuliers (72) d'aimants sont agencés dans le cylindre que l'on veut utiliser. Deux cylindres rotatifs adjacents peuvent être utilisés le cas échéant afin d'augmenter la vitesse de déposition du matériau pulvérisé sur un substrat. Les différentes caractéristiques de l'invention sont particulièrement adaptées à un magnétron cylindrique de grandes dimensions utilisé pour pulvériser des revêtements sur des parois de verre en architecture, sur des pare-brise d'automobiles et similaires, mais se prêtent également avec avantage au revêtement de substrats de dimensions réduites.
Designated States: AU, BB, BG, BR, CA, FI, HU, JP, KP, KR, LK, MC, MG, MW, NO, RO, SD, SU, US
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CM, GA, ML, MR, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0500774CA2069328KR1019920702436AU1991068948