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1. (WO1991007519) METHOD FOR COATING SUBSTRATES WITH SILICON BASED COMPOUNDS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/007519 International Application No.: PCT/US1990/006459
Publication Date: 30.05.1991 International Filing Date: 07.11.1990
Chapter 2 Demand Filed: 01.05.1991
IPC:
C23C 14/10 (2006.01) ,C23C 14/35 (2006.01) ,H01J 37/34 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
10
Glass or silica
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
35
by application of a magnetic field, e.g. magnetron sputtering
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
34
operating with cathodic sputtering
Applicants:
THE BOC GROUP, INC. [US/US]; 100 Mountain Avenue Murray Hill New Providence, NJ 07974, US (AllExceptUS)
WOLFE, Jesse, D. [US/US]; US (UsOnly)
BOEHMLER, Carolynn [US/US]; US (UsOnly)
HOFMANN, James, J. [US/US]; US (UsOnly)
Inventors:
WOLFE, Jesse, D.; US
BOEHMLER, Carolynn; US
HOFMANN, James, J.; US
Agent:
PARSONS, Gerald, P. ; Majestic, Parsons, Siebert & Hsue Four Embarcadero Center Suite 1450 San Francisco, CA 94111-4121, US
Priority Data:
433,69008.11.1989US
Title (EN) METHOD FOR COATING SUBSTRATES WITH SILICON BASED COMPOUNDS
(FR) PROCEDE DE REVETMENT DE SUBSTRATS AVEC DES COMPOSES A BASE DE SILICIUM
Abstract:
(EN) A method of depositing thin films of silicon based compounds, particularly silicon dioxide, by cathode reactive sputtering utilizes a rotating cylindrical magnetron (20) driven by a d.c. potential (30). The result is a technique of forming a uniform film on large substrates (12) with high deposition rates. Arcing normally associated with sputtering troublesome dielectric coatings such as silicon oxides is substantially eliminated.
(FR) Selon un procédé de déposition de minces pellicules de composés à base de silicium, notamment du dioxyde de silicium, par pulvérisation réactive cathodique, on utilise un magnétron cylindrique rotatif (20) entraîné par un potentiel de courant direct (30). On obtient ainsi une technique de formation d'une pellicule uniforme sur des substrats (12) de grandes dimensions à des vitesses élevées de déposition. On élimine la formation d'arcs qui accompagne normalement la pulvérisation de revêtements diélectriques difficiles tels que les oxydes de silicium.
Designated States: AU, BB, BG, BR, CA, FI, HU, JP, KP, KR, LK, MC, MG, MW, NO, RO, SD, SU, US
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
African Intellectual Property Organization (BF, BJ, CF, CG, CM, GA, ML, MR, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0502068JP3164364JPH05501587CA2069329DE000069018479KR1001996630000*
AU1991068730DK0502068