Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO1991006378) IMPROVED STEREOLITHOGRAPHIC CONSTRUCTION TECHNIQUES
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/006378 International Application No.: PCT/US1990/006293
Publication Date: 16.05.1991 International Filing Date: 30.10.1990
Chapter 2 Demand Filed: 29.03.1991
IPC:
B29C 67/00 (2006.01) ,B29C 67/02 (2006.01) ,G03F 7/00 (2006.01) ,G03F 7/20 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
67
Shaping techniques not covered by groups B29C39/-B29C65/93
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
67
Shaping techniques not covered by groups B29C39/-B29C65/93
02
Moulding by agglomerating
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
3D SYSTEMS, INC. [US/US]; 26081 Avenue Hall Valencia, CA 91335, US
Inventors:
JACOBS, Paul, Frances; US
HULL, Charles, William; US
SMALLEY, Dennis, Rollette; US
ALLISON, Joseph, Walter; US
Agent:
OHRINER, Kenneth, H. ; 611 West Sixth Street, 34th Floor Los Angeles, CA 90017, US
Priority Data:
429,43530.10.1989US
516,14527.04.1990US
Title (EN) IMPROVED STEREOLITHOGRAPHIC CONSTRUCTION TECHNIQUES
(FR) TECHNIQUES AMELIOREES DE CONSTRUCTION STEREOLITHOGRAPHIQUES
Abstract:
(EN) Improved methods for building stereolithographically-formed parts include providing skinned layers in more than the up- and down- facing features of the part, to methods for avoiding over-exposure of down-facing regions at points of intersection of exposing vectors, and to methods for determining skin thickness.
(FR) Procédés améliorés d'élaboration d'objets formés de manière stéréolithographique, consistant à produire des couches dépouillées dans des caractéristiques additionnelles aux caratéristiques de haut et de bas de l'objet, procédés permettant d'éviter la surexposition des régions du bas aux points d'intersection de vecteurs d'exposition, et procédés de détermination de l'épaisseur de la peau.
Designated States: CA, JP, KR
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
US5609812CA2072136KR1019927003294