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1. (WO1991005887) VACUUM VESSEL
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/005887 International Application No.: PCT/US1990/005994
Publication Date: 02.05.1991 International Filing Date: 18.10.1990
IPC:
C23C 14/56 (2006.01) ,H01L 21/00 (2006.01) ,H01L 21/677 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677
for conveying, e.g. between different work stations
Applicants:
VARIAN ASSOCIATES, INC. [US/US]; 3100 Hansen Way Palo Alto, CA 94304, US
Inventors:
WEINBERG, Richard, S.; US
Agent:
SGARBOSSA, Peter, J.; Varian Associates, Inc. 3100 Hansen Way Palo Alto, CA 94304, US
Priority Data:
423,80218.10.1989US
Title (EN) VACUUM VESSEL
(FR) ENCEINTE A VIDE
Abstract:
(EN) Pre- and post-processing of a semiconductor wafer within a main vacuum chamber (12) is accomplished by a wafer holder (18) disposed within a clam shell-like device (20). The clam shell device (20) includes a first member (22) disposed above the wafer holder (18) and a second member (24) disposed below the wafer holder (18) in a facing relationship to the first member (22). The first member (22) and the second member (24) each have a respective mating surface. The first member (22) and the second member (24) are movable between a closed position wherein the mating surface of each of the first member (22) and second member (24) hermetically engage each other and an open position. The clam shell device (20) forms an interior chamber (30) when in its closed position. Gases are evacuated from the interior chamber (30), exteriorally of the main chamber (12), when the clam shell device (20) is in a closed position to avoid contamination of the vacuum environment.
(FR) Le traitement préalable et postérieur d'une tranche de semi-conducteur à l'intérieur d'une enceinte à vide principale (12) est effectué par un porte-tranche (18) disposé à l'intérieur d'un dispositif à deux mâchoires (20). Le dispositif à deux mâchoires (20) comprend une première mâchoire (22) placée au-dessus du porte-tranche (18) et une seconde mâchoire (24) disposée au-dessous du porte-tranche (18) en face de la première mâchoire (22). La première mâchoire (22) et la seconde mâchoire (24) comportent chacune une surface d'assemblage respective. La première mâchoire (22) et la seconde mâchoire (24) sont mobiles entre une position fermée, dans laquelle la surface d'assemblage de chacune des mâchoires (22 et 24) vient se plaquer hermétiquement contre l'autre, et une position ouverte. Le dispositif à deux mâchoires (20) forme une chambre interne (30) lorsqu'il est en position fermée. Les gaz sont évacués de la chambre interne (30), vers l'extérieur de l'enceinte principale (12), lorsque le dispositif à deux mâchoires (20) est en position fermée, de façon à éviter toute contamination du milieusous-vide.
Designated States: JP, KR
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0448700KR1019920701512