Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO1991005743) METHOD FOR PREPARING VAPORIZED REACTANTS FOR CHEMICAL VAPOR DEPOSITION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1991/005743 International Application No.: PCT/US1990/005905
Publication Date: 02.05.1991 International Filing Date: 15.10.1990
IPC:
C03B 37/014 (2006.01) ,C03C 17/245 (2006.01) ,C23C 16/448 (2006.01)
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
B
MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
37
Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
01
Manufacture of glass fibres or filaments
012
Manufacture of preforms for drawing fibres or filaments
014
made entirely or partially by chemical means
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17
Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
22
with other inorganic material
23
Oxides
245
by deposition from the vapour phase
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
448
characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Applicants:
LIBBEY-OWENS-FORD CO. [US/US]; 811 Madison Avenue Toledo, OH 43695, US
Inventors:
SOUBEYRAND, Michel, J.; US
McCURDY, Richard, J.; US
Agent:
OBERLIN, Phillip, S.; Marshall & Melhorn Four SeaGate - Eighth Floor Toledo, OH 43604, US
Priority Data:
422,63617.10.1989US
591,12104.10.1990US
Title (EN) METHOD FOR PREPARING VAPORIZED REACTANTS FOR CHEMICAL VAPOR DEPOSITION
(FR) PROCEDE DE PREPARATION DE REACTIFS VAPORISES EN VUE DE LEUR DEPOT EN PHASE GAZEUSE PAR PROCEDE CHIMIQUE
Abstract:
(EN) Vaporized reactants, useful for chemical vapor deposition of a coating on the surface of a hot substrate, are prepared by initially heating a liquid coating precursor (10), injecting the liquid coating precursor into a vaporization chamber (12), simultaneously admitting a blend gas (19, 20) into the vaporization chamber, heating the liquid and blend gas to cause the liquid to vaporize at a temperature below its standard vaporization temperature, and thoroughly mixing the coating precursor vapor and blend gas, to produce a stream of vaporized reactant (25) for pyrolytic decomposition at the surface of the hot substrate. A horizontal thin film evaporator provides a particularly suitable vaporization chamber (12) for the present process.
(FR) On prépare des réactifs vaporisés, se prêtant au depôt en phase gazeuse par procédé chimique d'un revêtement sur la surface d'un substrat chaud, premièrement par chauffage d'un précurseur (10) de revêtement liquide, par injection du précurseur de revêtement liquide dans un chambre (12) de vaporisation, par admission simultanée d'un gaz de mélange (19, 20) dans ladite chambre de vaporisation, par chauffage du liquide et du gaz de mélange afin de provoquer la vaporisation du liquide à une température inférieure à sa température de vaporisation normale, puis par mélange intime de la vapeur du précurseur de revêtement et du gaz de mélange, afin de produire un courant de réactif (25) vaporisé destiné à subir une décomposition pyrolytique à la surface du substrat chaud. Un évaporateur à couche mince horizontale constitue une chambre (12) de vaporisation particulièrement adaptée au procédé de l'invention.
Designated States: AU, BG, FI, HU, JP, KR, NO, RO, SU
European Patent Office (AT, BE, CH, DE, DK, ES, FR, GB, GR, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
FI912845NO19912320EP0450016JP3078835KR1019920701064AU1990065297