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1. WO1991001038 - METHOD OF GENERATING HIGH-INTENSITY ELECTRON BEAM

Publication Number WO/1991/001038
Publication Date 24.01.1991
International Application No. PCT/JP1990/000892
International Filing Date 11.07.1990
IPC
H01J 3/02 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
3Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
02Electron guns
H01J 37/06 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
H05H 7/18 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
7Details of devices of the types covered by groups H05H9/-H05H13/102
14Vacuum chambers
18Cavities; Resonators
CPC
H01J 3/02
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
3Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
02Electron guns
H01J 37/06
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
06Electron sources; Electron guns
H05H 7/18
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
7Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
14Vacuum chambers
18Cavities; Resonators
Applicants
  • IKEGAMI, Hidetsugu [JP/JP]; JP
Inventors
  • IKEGAMI, Hidetsugu; JP
Agents
  • GOTO, Yosuke ; The Third Mori Building 4-10, Nishishinbashi 1-chome Minato-ku Tokyo 105, JP
Priority Data
1/17708511.07.1989JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METHOD OF GENERATING HIGH-INTENSITY ELECTRON BEAM
(FR) PROCEDE DE GENERATION D'UN FAISCEAU ELECTRONIQUE A GRANDE INTENSENSITE
Abstract
(EN)
A solenoïd magnetic field generating part (5) is arranged along an electron beam (0) of an electron beam unit, and a high-frequency resonator (4) for inducing cyclotron maser is provided in this part (5). High-frequency waves for inducing cyclotron maser are projected from the high-frequency resonator (4) in the same direction as, or opposite to, the travelling direction of the electron beam (0) to adjust the emittance of the electron beam (0) and to generate a high-intensity beam.
(FR)
Un élément générateur (5) d'un champ magnétique solénoïdal est disposé le long d'un faisceau électronique (0) d'une unité à faisceau électronique, et un résonateur à haute fréquence (4) servant à induire un maser à cyclotron est prévu dans ledit élément (5). Des ondes à haute fréquence destinées à induire le maser à cyclotron sont projetées par le résonateur à haute fréquence (4) dans le même sens que le sens de la progression du faisceau électronique (0), ou dans le sens contraire à celui-ci, afin de régler l'émittance du faisceau électronique (0) et de générer un faisceau à grande intensité.
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