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1. WO1991000377 - PROCESS FOR MAKING DIAMOND, DOPED DIAMOND, DIAMOND-CUBIC BORON NITRIDE COMPOSITE FILMS AT LOW TEMPERATURE

Publication Number WO/1991/000377
Publication Date 10.01.1991
International Application No. PCT/US1990/003596
International Filing Date 25.06.1990
Chapter 2 Demand Filed 13.12.1990
IPC
C23C 14/00 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
C23C 14/06 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
CPC
C23C 14/0021
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
0021Reactive sputtering or evaporation
C23C 14/0611
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06characterised by the coating material
0605Carbon
0611Diamond
Y10S 427/106
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
427Coating processes
103Diamond-like carbon coating, i.e. DLC
106Utilizing plasma, e.g. corona, glow discharge, cold plasma
Applicants
  • THE REGENTS OF THE UNIVERSITY OF CALIFORNIA [US/US]; 300 Lakeside Drive 22nd Floor Oakland, CA 94612-3550, US
Inventors
  • DESHPANDEY, Chandra, V.; US
  • BUNSHAH, Rointan, F.; US
  • DOERR, Hans, J.; US
Agents
  • OLDENKAMP, David, J. ; Poms, Smith, Lande & Rose 2121 Avenue of the Stars Suite 1400 Los Angeles, CA 90067, US
Priority Data
374,96630.06.1989US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) PROCESS FOR MAKING DIAMOND, DOPED DIAMOND, DIAMOND-CUBIC BORON NITRIDE COMPOSITE FILMS AT LOW TEMPERATURE
(FR) PROCEDE DE PRODUCTION DE PELLICULES EN DIAMANT, EN DIAMANT DOPE ET DES PELLICULES COMPOSITES EN DIAMANT ET EN NITRURE DE BORE CUBIQUE A BASSE TEMPERATURE
Abstract
(EN)
A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber (10) in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate (24) located within the vacuum chamber. The substrate temperature is maintained at between about 20-600°C.
(FR)
Procédé et appareil permettant de produire des pellicules en dimamant et en diamant dopé à des cadences élevées par déposition en phase vapeur réactive activée. Du carbone s'évapore dans une chambre à vide (10) en présence d'hydrogène atomique contenant un plasma pour former des précurseurs de diamants qui se déposent ensuite sur un substrat (24) placé dans la chambre à vide. La température du substrat est maintenue entre 20 et 600°C environ.
Also published as
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