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Machine translation
1. (WO1989004444) PROCESS FOR LIQUEFYING, CONCENTRATING AND PURIFYING NITROGEN TRIFLUORIDE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1989/004444    International Application No.:    PCT/JP1988/001120
Publication Date: 18.05.1989 International Filing Date: 04.11.1988
IPC:
C01B 21/083 (2006.01), F25J 1/02 (2006.01), F25J 3/08 (2006.01)
Applicants: MITSUI TOATSU CHEMICALS, INC. [JP/JP]; 2-5, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 100 (JP) (For All Designated States Except US).
HYAKUTAKE, Hiroyuki [JP/JP]; (JP) (For US Only).
HARADA, Isao [JP/JP]; (JP) (For US Only).
IWANAGA, Naruyuki [JP/JP]; (JP) (For US Only).
NISHITSUJI, Toshihiko [JP/JP]; (JP) (For US Only)
Inventors: HYAKUTAKE, Hiroyuki; (JP).
HARADA, Isao; (JP).
IWANAGA, Naruyuki; (JP).
NISHITSUJI, Toshihiko; (JP)
Agent: FUJIMOTO, Hiromitsu @; Fujimoto Patent & Law Office, Urban Toranomon Bldg. 7th Fl., 16-4, Toranomon 1-chome, Minato-ku, Tokyo 105 (JP)
Priority Data:
62/277514 04.11.1987 JP
Title (EN) PROCESS FOR LIQUEFYING, CONCENTRATING AND PURIFYING NITROGEN TRIFLUORIDE
(FR) PROCEDE DE LIQUEFACTION, DE CONCENTRATION ET DE PURIFICATION DE TRIFLUORURE D'AZOTE
Abstract: front page image
(EN)A process for continuously producing NF¿3? with safety and a process for removing O¿2?, N¿2?, etc. from NF¿3? containing them are disclosed. This process comprises introducing an additional gas such as He, Ne, etc. in the liquefaction and concentration of NF¿3? for preventing contamination with a H¿2? gas. In addition, a process of introducing one or more of He, Ne and Ar as a third component in low temperature distillation of the resulting liquefied NF¿3? is also disclosed. This invention enables continuous operation safely for a long time and a highly pure NF¿3? can be obtained since O¿2?, N¿2?, etc. in NF¿3? can be effectively removed.
(FR)Procédé de production sûr et en continu de NF¿3? et procédé d'extraction d'O¿2?, N¿2?, etc. du NF¿3? les contenant. Ce procédé consiste à introduire un gaz supplémentaire tel que He, Ne, etc. pendant la liquéfaction et la concentration du NF¿3? de manière à prévenir la contamination avec de l'H¿2? à l'état gazeux. Est également décrit un procédé consistant à introduire un gaz parmi He, Ne et Ar en tant que troisième composant pendant la distillation à basse température du NF¿3? liquéfié résultant. Cette invention permet un fonctionnement continu et sûr pendant une longue durée et permet d'obtenir du NF¿3? très pur, étant donné que l'O¿2?, le N¿2?, etc. dans le NF¿3? sont extraits efficacement.
Designated States: KR, US.
European Patent Office (BE, CH, DE, FR, GB, IT, NL, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)