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Machine translation
1. (WO1989004058) RETENTION VESSEL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1989/004058    International Application No.:    PCT/JP1987/000826
Publication Date: 05.05.1989 International Filing Date: 27.10.1987
IPC:
G02F 1/1333 (2006.01)
Applicants: MITSUI TOATSU CHEMICALS, INCORPORATED [JP/JP]; 2-5, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 100 (JP) (For All Designated States Except US).
GOTOH, Yoshihisa [JP/JP]; (JP) (For US Only).
KAWAMATA, Motoo [JP/JP]; (JP) (For US Only).
TAKAHASHI, Toshiaki [JP/JP]; (JP) (For US Only)
Inventors: GOTOH, Yoshihisa; (JP).
KAWAMATA, Motoo; (JP).
TAKAHASHI, Toshiaki; (JP)
Agent: WAKABAYASHI, Tadashi; 8th Floor, 16th Kowa Bldg., 9-20, Akasaka 1-chome, Minato-ku, Tokyo 107 (JP)
Priority Data:
Title (EN) RETENTION VESSEL
(FR) RECIPIENT DE RETENUE
Abstract: front page image
(EN)This invention relates to a retention vessel of a substrate in the production of a flat display such as a thin film semiconductor substrate for driving a liquid crystal display, which consists of a polyether-ether-ketone resin.
(FR)Récipient de retenue d'un substrat dans la production d'un affichage plat tel qu'un substrat semi-conducteur à film mince pour la commande d'un affichage à cristaux liquides, consistant en une résine de polyéther-éther-cétone.
Designated States: KR, US.
European Patent Office (AT, BE, CH, DE, FR, GB, IT, LU, NL, SE).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)