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1. (WO1989000549) APPARATUS FOR COATING A SUBSTRATE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1989/000549 International Application No.: PCT/US1988/001792
Publication Date: 26.01.1989 International Filing Date: 17.05.1988
Chapter 2 Demand Filed: 14.02.1989
IPC:
C03C 17/00 (2006.01) ,C23C 16/455 (2006.01) ,C23C 16/54 (2006.01)
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17
Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
54
Apparatus specially adapted for continuous coating
Applicants:
M & T CHEMICALS, INC. [US/US]; One Woodbridge Center Woodbridge, NJ 07095, US
Inventors:
LINDNER, Georg, Heinrich; US
Agent:
MELLER, Michael, N.; P.O. Box 2198 Grand Central Station New York, NY 10063, US
Priority Data:
071,50109.07.1987US
Title (EN) APPARATUS FOR COATING A SUBSTRATE
(FR) APPAREIL D'APPLICATION D'UN REVETEMENT SUR UN SUBSTRAT
Abstract:
(EN) A coating applicator is provided for depositing a film on a surface of glass (12) and other substrates by chemical vapor deposition. The applicator includes a pair of opposing coating nozzles (10a and 10b) for applying a vaporized coating chemical reactant in a carrier gas to the surface at such a concentration and velocity that coating of the surface is achieved under substantially reaction rate controlled conditions. Each coating nozzle (10a and 10b) is positioned adjacent the surface (12) with a small clearance (C) therebetween which is open to the outside atmosphere. The opposing coating nozzles are directed toward each other at a selected angle with respect to a normal to the surface (12) of the substrate. The angle and the clearance provide a condition where there is substantially no intermixing of coating vapors with the outside atmosphere.
(FR) Un appareil d'application d'un revêtement permet de déposer une pellicule sur une surface de verre (12) ou autres substrats par déposition en phase gazeuse par procédé chimique. Le dispositif d'application comprend une paire d'ajutages opposés de revêtement (10a et 10b) pour appliquer un réactant chimique de revêtement vaporisé dans un gaz porteur sur la surface à une concentration et une vitesse telles que le revêtement de la surface est effectué dans des conditions de vitesse de réaction régulée. Chaque ajutage de revêtement (10a et 10b) est positionné adjacent à la surface (12) avec un petit écart (C) entre l'ajutage et la surface, cet écart étant ouvert à l'atmosphère extérieure. Les ajutages opposés de revêtement sont dirigés l'un vers l'autre suivant un angle sélectionné par rapport à une normale à la surface (12) du substrat. L'angle et l'écart ou intervalle de séparation établissent des conditions dans lesquelles il n'y a aucun mélange entre les vapeurs de revêtement et l'atmosphère extérieure.
Designated States: AU, FI, JP, KR
European Patent Office (AT, BE, CH, DE, FR, GB, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
FI900082EP0370027JPH03503067CA1334910KR1019890701490AU1988019344