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1. (WO1987003387) THERMALLY STABILIZED PHOTORESIST IMAGES
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1987/003387 International Application No.: PCT/US1986/002441
Publication Date: 04.06.1987 International Filing Date: 12.11.1986
IPC:
G03F 7/40 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26
Processing photosensitive materials; Apparatus therefor
40
Treatment after imagewise removal, e.g. baking
Applicants:
MACDERMID, INCORPORATED [US/US]; 50 Brookside Road Waterbury, CT 06708, US
Inventors:
GRUNWALD, John, J.; US
SPENCER, Allen, C.; US
Agent:
ST. ONGE, Ronald, J.; St. Onge, Steward, Johnston & Reens 986 Bedford Street Stamford, CT 06905, US
Priority Data:
802,51427.11.1985US
823,94229.01.1986US
879,38527.06.1986US
Title (EN) THERMALLY STABILIZED PHOTORESIST IMAGES
(FR) IMAGES SUR PHOTORESERVE A STABILISATION THERMIQUE
Abstract:
(EN) Photoresist image layers, particularly those used for high resolution geometries in microelectronic applications, are stabilized against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like, by the application of a film of a thermally stabilizing agent prior to postdevelopment bake of the image layer. The process serves to achieve thermal stabilization of the photoresist image layer without significantly affecting the ease of subsequent stripping of the layer. It is particularly effective when used to thermally stabilize positive resist images derived from photoresist systems based on novolak resins.
(FR) Les couches d'images sur photoréserve, notamment celles utilisées pour la représentation de tracés géométriques à haute définition pour des applications dans le domaine de la micro-électronique, sont stabilisées contre la déformation ou la dégradation par la chaleur produite pendant les étapes successives d'attaque, d'implantation ionique et analogue, par l'application d'un film d'un agent thermo-stabilisateur avant la cuisson de post-développement de la couche d'images. Ce procédé permet d'obtenir une stabilisation thermique de la couche d'images sur photoréserve sans affecter de manière significative le processus successif de pelage de la couche. Ce procédé peut être utilisé avec une grande efficacité pour stabiliser thermiquement les images positives sur réserve dérivées de systèmes de photoréserve à base de résines novolak.
Designated States: AU, JP
European Patent Office (AT, BE, CH, DE, FR, GB, IT, LU, NL, SE)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
EP0247153AU1986066292