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Machine translation
1. (WO1985005721) METHOD OF MANUFACTURING STAMPER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1985/005721    International Application No.:    PCT/JP1985/000297
Publication Date: 19.12.1985 International Filing Date: 29.05.1985
IPC:
G03F 7/039 (2006.01), G11B 7/26 (2006.01)
Applicants: HITACHI, LTD. [JP/JP]; 6, Kanda Surugadai 4-chome, Chiyoda-ku, Tokyo 101 (JP) (For All Designated States Except US).
ITO, Masaru [JP/JP]; (JP) (For US Only).
OKAZAKI, Shinji [JP/JP]; (JP) (For US Only).
TSUNODA, Yoshito [JP/JP]; (JP) (For US Only).
HARA, Fumio [JP/JP]; (JP) (For US Only)
Inventors: ITO, Masaru; (JP).
OKAZAKI, Shinji; (JP).
TSUNODA, Yoshito; (JP).
HARA, Fumio; (JP)
Agent: OGAWA, Katuo; Patent Department of Hitachi, Ltd., 5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 100 (JP)
Priority Data:
59/110715 01.06.1984 JP
Title (EN) METHOD OF MANUFACTURING STAMPER
(FR) PROCEDE DE PRODUCTION D'UNE MATRICE
Abstract: front page image
(EN)A method of manufacturing a stamper having a high density and a low reject rate. An organic film formed on the substrate is irradiated with a charged particle beam such as an electron beam or ion beam, in order to form a rugged pattern on the organic film so as to use it as a stamper. Namely, the stamper is directly formed without passing through the steps of forming, first, a mother disc and then forming a stamper from the mother disc. Therefore, the number of steps is reduced and the reject rate is reduced, too, making the method ideal for the manufacture of stampers for high density optical discs.
(FR)Procédé de production d'une matrice de haute densité et avec un faible taux de rebut. Un film organique formé sur le substrat est irradié avec un faisceau de particules chargées, tel qu'un faisceau d'électrons ou d'ions, afin de former une texture scabreuse sur le film organique pour l'utiliser comme matrice. Celle-ci est ainsi formé directement, sans passer par les étapes consistant à former, d'abord, un disque mère et ensuite une matrice à partir du disque mère. Par conséquent le nombre d'étapes est réduit et le taux de rebut diminue; ce procédé est donc idéal dans la fabrication de matrices pour disques optiques de haute densité.
Designated States: US.
European Patent Office (DE, FR, GB).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)