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Machine translation
1. (WO1981003239) ION IMPLANTATION APPARATUS FOR SEMICONDUCTOR MANUFACTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1981/003239    International Application No.:    PCT/JP1981/000099
Publication Date: 12.11.1981 International Filing Date: 27.04.1981
IPC:
C30B 31/22 (2006.01), H01J 37/05 (2006.01), H01J 37/317 (2006.01)
Applicants:
Inventors:
Priority Data:
80/57838 02.05.1980 JP
Title (EN) ION IMPLANTATION APPARATUS FOR SEMICONDUCTOR MANUFACTURE
(FR) APPAREIL D"IMPLANTATION D"IONS POUR LA FABRICATION DE SEMI-CONDUCTEURS
Abstract: front page image
(EN)An apparatus for implanting ions into the wafer (22) in the manufacture of a semiconductor device, especially an apparatus suitable for implanting double-charge ions into the wafer (22). Only those ions having predetermined masses are chosen by the mass-separation electromagnet (14) from among ion beams (12) originating from the ion source (10) and implanted into the wafer (22) through the slit (16). Between the slit (16) and the mass-separation electromagnet (14) are provided electrodes (24) for separating ions having different energy levels disposed with the direction of deflection parallel to that of the mass-separation electromagnet, and a deflective magnetic field (26) for separating neutral particles and so on disposed with the direction of deflection perpendicular to that of the mass-separation electromagnet.
(FR)Un appareil permet l"implantation d"ions dans la tranche (22) pour fabriquer un dispositif a semi-conducteur, en particulier un appareil approprie a l"implantation d"ions a charge double dans la tranche (22). Seuls les ions ayant des masses predeterminees sont choisis par l"electro-aimant de separation de masse (14) parmi des faisceaux d"ions (12) provenant de la source d"ions (10) et sont implantes dans la tranche (22) au travers de la fente (16). Entre la fente (16) et l"electro-aimant de separation de masse (14) des electrodes (24) sont prevues pour separer les ions ayant des niveaux d"energie differents disposees avec un sens de deflexion parallele a celui de l"electro-aimant de separation de masse, et un champ magnetique de deflexion (26) pour separer les particules neutres et dispose avec un sens de deflexion perpendiculaire a celui de l"electro-aimant de separation de masse.
Designated States:
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)