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Machine translation
1. (WO1981001529) CHEMICAL VAPOUR DEPOSITION PROCESS WITH LAZER HEATING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1981/001529    International Application No.:    PCT/BR1980/000013
Publication Date: 11.06.1981 International Filing Date: 26.11.1980
IPC:
C23C 16/48 (2006.01)
Applicants:
Inventors:
Priority Data:
7908672 30.11.1979 BR
Title (EN) CHEMICAL VAPOUR DEPOSITION PROCESS WITH LAZER HEATING
(FR) PROCEDE DE DEPOT DE VAPEUR CHIMIQUE AVEC CHAUFFAGE AU LASER
Abstract: front page image
(EN)A chemical vapor deposition coating process that uses lazer (1) irradiation for localized heating of a wafer (6) to be coated, giving spatial control of the coating deposit and cleaner growth of the coating film. The process avoids the growth of material on surfaces where no coating is desired and undesirable diffusion processes between the deposited film and the wafer. Also avoided is the absorption of significant quantities of energy by the reactants which is also undesirable.
(FR)Un procede de revetement par depot d"une vapeur chimique utilise une irradiation au laser (1) pour effectuer le chauffage localise d"une tranche (6) a enrober, assurant un controle dans l"espace du depot d"enrobage et une croissance plus nette de la pellicule de depot Le procede empeche la croissance de materiau sur les surfaces ou l"on ne desire pas d"enrobage et empeche une diffusion indesirable entre la pellicule de depot et la tranche. Il permet egalement d"eviter l"absorption indesirable de quantites importantes d"energie par les agents de reaction.
Designated States:
Publication Language: English (EN)
Filing Language: English (EN)