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Machine translation
1. (WO1981000646) DEVICE MANUFACTURE INVOLVING PATTERN DELINEATION IN THIN LAYERS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1981/000646    International Application No.:    PCT/US1980/000934
Publication Date: 05.03.1981 International Filing Date: 28.07.1980
IPC:
G01N 17/02 (2006.01), G01R 31/302 (2006.01), G03F 7/30 (2006.01), H01L 21/311 (2006.01), H01L 21/66 (2006.01)
Applicants:
Inventors:
Priority Data:
71408 30.08.1979 US
Title (EN) DEVICE MANUFACTURE INVOLVING PATTERN DELINEATION IN THIN LAYERS
(FR) FABRICATION D"UN DISPOSITIF COMPORTANT UNE TRACE DE MODELES DANS DES COUCHES FINES
Abstract: front page image
(EN)Etch procedures are monitored electrically by initiation of current flow upon baring of conducting surface (19) to etching fluid (11). Procedures include photoresist development in which current flow is through the usual aqueous ionic developing solution. In an exemplary use, a specifically designed monitoring wafer (10) serves for detection of end point for a batch of wafers undergoing processing.
(FR)Des procedes de gravure sont controles electriquement par l"initiation d"un flux de courant sur la partie mise a nu d"une surface conductrice (19) exposee au fluide de gravure chimique (11). Les procedes comprennent ce developpement d"une photo reserve, dans lequel le flux de courant se produit a travers la solution aqueuse habituelle de developpement ionique. Dans une utilisation typique, une gaufrette de controle specifiquement concue (10) sert a detecter le point final pour un lot de gaufrettes en traitement.
Designated States:
Publication Language: English (EN)
Filing Language: English (EN)