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Machine translation
1. (WO1980001002) PATTERN INSPECTION SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1980/001002    International Application No.:    PCT/JP1979/000271
Publication Date: 15.05.1980 International Filing Date: 25.10.1979
IPC:
G01B 11/02 (2006.01), G06K 9/54 (2006.01), G06T 7/60 (2006.01)
Applicants:
Inventors:
Priority Data:
78/146865 28.11.1978 JP
Title (EN) PATTERN INSPECTION SYSTEM
(FR) SYSTEME D"INSPECTION DE MOTIFS
Abstract: front page image
(EN)Pattern inspection system for patterns (1a) formed on a substrate (1) such as photo mask by means of laser beam scanning. The system includes means (10, 11) for detecting pattern states in a plurality of separate directions, a memory device (12) having a plurality of memory units for storing the pattern states detected separately, and a means (13) for measuring pattern width in the direction perpendicular to the direction of the patterns.
(FR)Un systeme d"inspection de motifs pour des motifs (1a) formes sur un substrat (1) tel qu"un photomasq ue est effectue par exploration au rayon laser. L e systeme comprend des moyens (10, 11) de detection d"etats de motifs dans plusieurs directions separees, un dispositif a memoire (12) ayant une pluralite de memoires pour emmagasiner les etats des motifs detectes separement, et des moyens (13) de mesure de la largeur du motif dans le sens perpendiculaire a la direction des motifs.
Designated States:
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)