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Machine translation
1. (WO1980000634) RADIATION MASK STRUCTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1980/000634    International Application No.:    PCT/US1979/000692
Publication Date: 03.04.1980 International Filing Date: 06.09.1979
IPC:
G03F 1/22 (2012.01), G21K 5/02 (2006.01), H01L 21/027 (2006.01), H01L 21/30 (2006.01)
Applicants:
Inventors:
Priority Data:
941776 13.09.1978 US
Title (EN) RADIATION MASK STRUCTURE
(FR) STRUCTURE DE MASQUAGE POUR LES RADIATIONS
Abstract: front page image
(EN)The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films (13) lead to related mask structures (10) utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.
(FR)La decouverte que des films en nitrure ou carbure de bore peuvent etre obtenus sous tension permet la realisation de fenetres ou de masques sans distorsion des radiations. Des techniques a la fois a basse et a haute pression pour la preparation de ces films ductiles (13) aboutissent a des structures de masques equivalentes (10) utilisant de tels films. Les structures resultantes sont suffisamment exemptes de distorsion pour etre utiles dans la lithographie aux rayons-X.
Designated States:
Publication Language: English (EN)
Filing Language: English (EN)