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1. (WO1979000876) AUTOMATIC PHOTOMASK INSPECTION SYSTEM AND APPARATUS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/1979/000876 International Application No.: PCT/US1979/000207
Publication Date: 01.11.1979 International Filing Date: 02.04.1979
IPC:
G01B 11/00 (2006.01) ,G01B 11/24 (2006.01) ,G01B 11/245 (2006.01) ,G01B 11/30 (2006.01) ,G01C 3/00 (2006.01) ,G01C 3/06 (2006.01) ,G01N 21/88 (2006.01) ,G01N 21/93 (2006.01) ,G01N 21/956 (2006.01) ,G02B 7/32 (2006.01) ,G03F 1/84 (2012.01) ,H01L 21/302 (2006.01)
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
24
for measuring contours or curvatures
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
24
for measuring contours or curvatures
245
using a plurality of fixed, simultaneously operating transducers
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11
Measuring arrangements characterised by the use of optical means
30
for measuring roughness or irregularity of surfaces
G PHYSICS
01
MEASURING; TESTING
C
MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
3
Measuring distances in line of sight; Optical rangefinders
G PHYSICS
01
MEASURING; TESTING
C
MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
3
Measuring distances in line of sight; Optical rangefinders
02
Details
06
Use of electric means to obtain final indication
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
93
Detection standards; Calibrating
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
956
Inspecting patterns on the surface of objects
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7
Mountings, adjusting means, or light-tight connections, for optical elements
28
Systems for automatic generation of focusing signals
30
using parallactic triangle with a base line
32
using active means, e.g. light emitter
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
1
Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
68
Preparation processes not covered by groups G03F1/20-G03F1/5096
82
Auxiliary processes, e.g. cleaning
84
Inspecting
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302
to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
Applicants:
Inventors:
Priority Data:
89297203.04.1978US
Title (EN) AUTOMATIC PHOTOMASK INSPECTION SYSTEM AND APPARATUS
(FR) SYSTEME AUTOMATIQUE D"INSPECTION DES PHOTOMASQUES ET APPAREIL
Abstract:
(EN) Optical inspection apparatus for detecting differences between two dies in a photomask and including a carriage (30) for supporting the objects (34) to be inspected and for simultaneously moving such objects along an inspection path, an illuminator (44) for illuminating corresponding portions of the objects as they are moved along the inspection path, electro-optical detectors (46, 52 and 48, 54) for individually inspecting the illuminated portions and for developing first and second electrical signals respectively corresponding thereto, electronic memories (58 and 60) for storing the first and second electrical signals, microprocessor (64) for scanning the memories and for electronically aligning a readout of the first signal relative to a readout of the second signal, and for comparing the electronically aligned signals and indicating any differences therebetween.
(FR) Appareil d"inspection optique pour detecter des differences entre deux colorations dans un photomasque et comprenant un chariot (30) pour supporter les objets (34) a inspecter et pour les deplacer simultanement le long d"un trajet d"inspection, un dispositif d"eclairage (44) pour illuminer les parties correspondantes des objets lorsqu"ils se deplacent le long du chemin d"inspection, des detecteurs electro-optiques (46, 52 et 48, 54) pour controler individuellement les parties eclairees et pour produire des premier et second signaux electriques leur correspondant respectivement, des memoires electroniques (58 et 60) pour et emmagasiner les premier et second signaux electriques, un microprocesseur (64) pour analyser les me aligner electroniquement une sortie du premier signal par rapport a une sortie du second signal, comparer les signaux electroniquement alignes et indiquer leurs differences.
Designated States:
Publication Language: English (EN)
Filing Language: English (EN)