WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO1979000340) X-RAY LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/1979/000340    International Application No.:    PCT/US1978/000179
Publication Date: 14.06.1979 International Filing Date: 30.11.1978
IPC:
G03F 7/20 (2006.01)
Applicants:
Inventors:
Priority Data:
857380 05.12.1977 US
Title (EN) X-RAY LITHOGRAPHY
(FR) LITHOGRAPHIE A RAYONS X
Abstract: front page image
(EN)X-ray lithographic system as heretofore constructed include a low-attenuation chamber (40) for propagating x-rays from a source (32) toward a mask member (44) that is positioned in close proximity to a resistcoated wafer (49). Both the mask and the wafer are included in the chamber which typically is either filled with helium or evacuated to a pressure less than about 10-2 Torr. In accordance with this invention, an x-ray lithographic system is constructed to enable establishment in the wafer-to-mask region of a controlled atmosphere that is separate and distinct from that main- tained in the low-attenuation chamber. In this way, an improved lithographic system with advantageous throughput and other characteristics is realized.
(FR)Les systemes lithographiques a rayons X fabriques jusqu"a present comprennent une chambre a faible attenuation (40) de propagation des rayons X provenant d"une source (32) et diriges vers un cache (44) qui est place a proximite etroite d"un disque avec revetement - reserve (49). Le cache et le disque sont inclus dans la chambre qui est, de facon caracteristique, soit remplie d"helium, soit sous vide a une pression inferieure a 10-2 Torr environ. Selon cette invention, un systeme lithographique a rayons X est construit pour permettre d"etablir, dans la region disque-cache, une atmosphere controlee qui est separee et differente de celle maintenue dans la chambre a faible attenuation. De cette maniere, on obtient un systeme lithographique ameliore ayant un debit de traitement avantageux et d"autres avantages.
Designated States:
Publication Language: English (EN)
Filing Language: English (EN)