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1. US20060270242 - Cleaning method and solution for cleaning a wafer in a single wafer process

Office
United States of America
Application Number 11497025
Application Date 31.07.2006
Publication Number 20060270242
Publication Date 30.11.2006
Grant Number 7469883
Grant Date 30.12.2008
Publication Kind B2
IPC
B01F 3/04
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
FMIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
3Mixing, e.g. dispersing, emulsifying, according to the phases to be mixed
04gases or vapours with liquids
CPC
B08B 3/08
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3Cleaning by methods involving the use or presence of liquid or steam
04Cleaning involving contact with liquid
08the liquid having chemical or dissolving effect
C11D 1/29
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS
1Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
02Anionic compounds
12Sulfonic acids or sulfuric acid esters; Salts thereof
29Sulfates of polyoxyalkylene ethers
C11D 1/72
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS
1Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
66Non-ionic compounds
72Ethers of polyoxyalkylene glycols
C11D 3/044
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS
3Other compounding ingredients of detergent compositions covered in group C11D1/00
02Inorganic compounds ; ; Elemental compounds
04Water-soluble compounds
044Hydroxides, bases
C11D 3/32
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS
3Other compounding ingredients of detergent compositions covered in group C11D1/00
16Organic compounds
26containing nitrogen
32Amides; Substituted amides
C11D 3/33
CCHEMISTRY; METALLURGY
11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
DDETERGENT COMPOSITIONS
3Other compounding ingredients of detergent compositions covered in group C11D1/00
16Organic compounds
26containing nitrogen
33Amino carboxylic acids
Applicants Applied Materials, Inc.
Inventors Verhaverbeke Steven
Truman Kelly
Agents Blakely Sokoloff Taylor &; Zafman, LLP
Priority Data 09891730 25.06.2001 US
11145304 03.06.2005 US
60214116 26.06.2000 US
Title
(EN) Cleaning method and solution for cleaning a wafer in a single wafer process
Abstract
(EN)

The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NH4OH), hydrogen peroxide (H2O2), water (H2O) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. And still yet another embodiment of the present invention the cleaning solution also comprises a dissolved gas such as H2. In a particular embodiment of the present invention, this solution is used by spraying or dispensing it on a spinning wafer.