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1. (PH1/2018/501573) POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION

Office : Philippines
Application Number: 1/2018/501573 Application Date: 05.02.2016
Publication Number: 1/2018/501573 Publication Date: 15.04.2019
Publication Kind : A1
Prior PCT appl.: Application Number:PCTJP2016000618 ; Publication Number:WO2017134701 Click to see the data
IPC:
G03F 7/023
G03F 7/004
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
022
Quinonediazides
023
Macromolecular quinonediazides; Macromolecular additives, e.g. binders
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants: HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
Inventors: NAKAMURA, Tadamitsu
MATSUKAWA, Daisaku
Agents: A.Q. ANCHETA AND PARTNERS
Priority Data:
Title: (EN) POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
Abstract:
(EN) Provided is a positive-type photosensitive resin composition containing (a) a polybenzoxazole precursor, (b) a crosslinking agent, (c) a photosensitizer, and (d) a solvent, wherein the (a) polybenzoxazole precursor includes a structure represented by formula (1) below, and the (c) photosensitizer includes a structure represented by formula (2) below. In formula (1), U represents a divalent organic group, a single bond, -O-, or -SO2-, and V represents a group which contains an aliphatic structure having 1-30 carbon atoms.
Also published as:
SG11201806631WCN108604059KR1020180101441EP3413132US20190049842WO/2017/134701