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1. KR1020070067194 - SYSTEMS AND METHODS FOR ION BEAM FOCUSING

Office
Republic of Korea
Application Number 1020077010575
Application Date 10.05.2007
Publication Number 1020070067194
Publication Date 27.06.2007
Grant Number 1012441160000
Grant Date 18.03.2013
Publication Kind B1
IPC
H01J 37/317
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
H01J 37/30
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
Applicants AXCELIS TECHNOLOGIES, INC.
액셀리스 테크놀로지스, 인크.
Inventors BENVENISTE VICTOR
벤베니스테 빅터
KELLERMAN PETER
켈러맨 피터
Agents 권동용
박병석
서장찬
최재철
Priority Data 10967855 18.10.2004 US
Title
(EN) SYSTEMS AND METHODS FOR ION BEAM FOCUSING
(KO) 이온 빔 집속 시스템 및 방법
Abstract
(EN)

Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-varying focusing field center generally corresponding to a time-varying beam position of a scanned ion beam along a scan direction. Methods are presented, comprising providing a focusing field having a focusing field center in the scan plane, and dynamically adjusting the focusing field such that the focusing field center is generally coincident with a time-varying beam position of the scanned ion beam along the scan direction.

© KIPO & WIPO 2007


(KO) 이온 주입기 내에 주사된 이온 빔을 집속하는 시스템 및 방법이 제공된다. 일반적으로 주사 방향을 따라 주사된 이온 빔의 시변 빔 위치에 대응하는 시변 집속장 센터를 가진 자기 집속장을 유기적으로 제공하는 대응하는 자기장을 제공하는 제 1 및 2 자석을 포함하는 빔 집속 시스템이 제공된다. 주사면 내에 집속장 센터를 가진 집속장을 제공하는 단계 및, 집속장 센터가 주사 방향을 따라 주사된 이온 빔의 시변 빔 위치와 일반적으로 일치하도록 집속장을 동적으로 조정하는 단계를 포함하는 방법이 제공된다.