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1. KR1020070058658 - SUBSTRATE TREATING DEVICE AND SUBSTRATE ROTATING DEVICE

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Office
Republic of Korea
Application Number 1020077009523
Application Date 26.04.2007
Publication Number 1020070058658
Publication Date 08.06.2007
Publication Kind A
IPC
H01L 21/68
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68for positioning, orientation or alignment
CPC
H01L 21/68792
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
683for supporting or gripping
687using mechanical means, e.g. chucks, clamps or pinches
68714the wafers being placed on a susceptor, stage or support
68792characterised by the construction of the shaft
H01L 21/67109
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67098Apparatus for thermal treatment
67109mainly by convection
Applicants TOKYO ELECTRON LIMITED
동경 엘렉트론 주식회사
Inventors TANAKA SUMI
다나카 스미
SUZUKI KOUKI
스즈키 고우키
Agents 김창세
Priority Data 2004313919 28.10.2004 JP
Title
(EN) SUBSTRATE TREATING DEVICE AND SUBSTRATE ROTATING DEVICE
(KO) 기판 처리 장치 및 기판 회전 장치
front page image
Abstract
(EN)

A substrate treating device and a substrate rotating device. The substrate rotating device comprises a rotatably driven body (11) connected to substrate supporting bodies (12, 13, 14) and a rotatingly driving body (10) rotatingly driving the rotatingly driven body (11) by rotating in the state of coming into contact with the rotatingly driven body (11). The rotatingly driven body (11) and the rotatingly driving body (10) are formed of a ceramics material.

© KIPO & WIPO 2007


(KO) 기판 지지체(12, 13, 14)에 연결된 종동 회전체(11)와, 상기 종동 회전체(11)에 접촉한 상태에서 회전함으로써, 상기 종동 회전체(11)를 회전 구동하는 구동 회전체(10)를 구비한 기판 회전 장치에 있어서, 이들 종동 회전체(11), 구동 회전체(10)를 세라믹 재료에 의해 구성한다.
Related patent documents
JP2006128368
CN101515541
US20080042328
CN101010792
WO/2006/046649
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