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1. KR1020080033230 - OPTIMIZING USE AND PERFORMANCE OF OPTICAL SYSTEMS IMPLEMENTED WITH TELECENTRIC ON-AXIS DARK FIELD ILLUMINATION

Office Republic of Korea
Application Number 1020087000133
Application Date 03.01.2008
Publication Number 1020080033230
Publication Date 16.04.2008
Publication Kind A
IPC
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
66
Testing or measuring during manufacture or treatment
H01L 21/66
CPC
G01N 21/9501
G01N 21/47
G01N2021/8822
G02B 13/22
Applicants ELECTRO SCIENTIFIC INDUSTRIES, INC.
Inventors BALDWIN LEO
EMERY JOSEPH J.
Priority Data 2005 697904 08.07.2005 US
Title
(EN) OPTIMIZING USE AND PERFORMANCE OF OPTICAL SYSTEMS IMPLEMENTED WITH TELECENTRIC ON-AXIS DARK FIELD ILLUMINATION
Abstract
(EN)
Systems and methods are provided for imaging a planar specular object (102) such as a semiconductor wafer. In one embodiment, an imaging system (100) for imaging a defect on a planar specular object (102) includes a telecentric lens (110) having a sufficiently aspherical surface such that the telecentric lens (110) is substantially corrected for an optical aberration. The imaging system (100) also includes a telecentric stop (116) including an aperture therein to block light reflected from the planar specular object (102) while allowing light reflected from the defect to pass through the aperture. The imaging system (100) further includes a lens group (108) having a system stop positioned between the telecentric stop (116) and the lens group (108). The lens group (108) is substantially corrected for the optical aberration independent of the telecentric lens (110). ┬ęKIPO&WIPO 2008

Also published as
GB0724025.2
GB724025
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