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1. (KR1020080022226) PROCESS FOR PRODUCING RESIST COMPOSITION, FILTERING APPARATUS, RESIST COMPOSITION APPLICATOR, AND RESIST COMPOSITION

Office : Republic of Korea
Application Number: 1020087002444 Application Date: 29.01.2008
Publication Number: 1020080022226 Publication Date: 10.03.2008
Publication Kind : A
IPC:
G03F 7/004
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
CPC:
B01D 61/14
B01D 63/02
G03F 7/0397
G03F 7/0045
G03F 7/027
B01D 71/26
G03F 7/26
Applicants: TOKYO OHKA KOGYO CO., LTD.
Inventors: MUROI MASAAKI
OZAKI HIROKAZU
Priority Data: 2005 2005208543 19.07.2005 JP
Title: (EN) PROCESS FOR PRODUCING RESIST COMPOSITION, FILTERING APPARATUS, RESIST COMPOSITION APPLICATOR, AND RESIST COMPOSITION
Abstract: front page image
(EN) A process for producing a resist composition in which a resist composition having the occurrence of defects therein suppressed can be obtained; a filtering apparatus suitable for use in the process; a resist composition applicator having the filtering apparatus mounted thereon; and a resist composition having the occurrence of defects therein suppressed. This resist composition is obtained by first providing a resist composition having, dissolved in an organic solvent, a resist component whose solubility in alkali is varied by the action of an acid and an acid generator component capable of generating an acid when exposed to light and thereafter passing the resist composition through a filter equipped with a polyethylene hollow yarn membrane. ┬ęKIPO&WIPO 2008
Also published as:
JP2007025341US20090286178CN101223482WO/2007/010794