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1. KR1020010033185 - FOCUS RINGS AND METHODS THEREFOR

Office
Republic of Korea
Application Number 1020007006568
Application Date 16.06.2000
Publication Number 1020010033185
Publication Date 25.04.2001
Grant Number 1006356930000
Grant Date 17.10.2006
Publication Kind B1
IPC
H01J 37/32
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
Applicants LAM RESEARCH CORPORATION
로브그렌 리차드 에이치.램 리서치 코포레이션
Inventors DHINDSA RAJINDER
딘사,라진더
TOKUNAGA KEN
토쿠나가,켄
SINGH VIKRAM
싱,비크람
Agents 강명구
강석용
Priority Data 08993791 19.12.1997 US
Title
(EN) FOCUS RINGS AND METHODS THEREFOR
(KO) 플라즈마 처리 챔버 포커스 링
Abstract
(EN)

An improved focus ring configured for use in a plasma processing chamber is disclosed. The focus ring is configured to overlap at least a portion of a substrate-holding chuck that is powered by radio frequency (RF) power during plasma operation to act as an electrode. The focus ring includes an upper surface that is exposed to a plasma region within the plasma processing chamber during the plasma operation. The focus ring further includes a chuck-overlapping portion that overlaps the portion of the substrate- holding chuck, at least a portion of the chuck-overlapping portion being formed of a first material having a lower dielectric constant than a remainder of the focus ring.

© KIPO & WIPO 2007


(KO) 플라즈마 처리챔버에서 사용하도록 구성된 개선된 포커스 링이 발표된다. 본 포커스 링은 플라즈마 작동동안 고주파(RF) 전력에 의해 에너지를 받아 전극으로서 작용하는 기판-유지척의 적어도 일부를 중첩하도록 구성된다. 포커스 링은 플라즈마 작동동안 플라즈마 처리챔버내에서 플라즈마 영역에 노출되는 상부 표면을 가진다. 포커스 링은 또한 기판유지척의 부위를 중첩하는 척 중첩부위를 포함하며, 척 중첩부위의 적어도 일부는 포커스 링의 다른 부위보다 낮은 유전상수를 갖는 제 1 재료로 형성된다.