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1. (KR1020180116308) 유기금속 화합물 및 방법

Office : Republic of Korea
Application Number: 1020187026118 Application Date: 10.02.2017
Publication Number: 1020180116308 Publication Date: 24.10.2018
Publication Kind : A
Prior PCT appl.: Application Number: ; Publication Number:WO2017136945 Click to see the data
IPC:
C07F 7/02
C23C 16/40
C23C 16/455
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7
Compounds containing elements of the 4th Group of the Periodic System
02
Silicon compounds
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22
characterised by the deposition of inorganic material, other than metallic material
30
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
40
Oxides
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Applicants: 시스타 케미칼즈 유엘씨
Inventors: 오데드라 라제쉬
동 쿤하이
챔벨라 숀
Agents: 문두현
Priority Data: 2920646 12.02.2016 CA
Title: (KO) 유기금속 화합물 및 방법
Abstract: front page image
(KO) 다음의 유기금속 화합물이 제공된다. 당해 화합물은 식 1로 표시되는 구조에 해당한다: [식 1] (A)-M-(OR) 식 중, A는 -NRR, -N(R)(CH)N(RR), -N=C(NRR)(NRR), OCOR, 할로기 및 Y로 이루어지는 군에서 선택된다; R 및 R는 독립적으로 H 및 1~8의 탄소 원자수를 갖는 환상 또는 비환상의 알킬기(단, R 및 R의 적어도 하나는 H가 아니어야 한다)로 이루어지는 군에서 선택된다; R, R, R 및 R은 독립적으로 H 및 1~4의 탄소 원자수를 갖는 비환상 알킬기로 이루어지는 군에서 선택된다; Y는 적어도 하나의 질소 원자를 함유하는 3 내지 13원 복소환식 라디칼로 이루어지는 군에서 선택된다; R은 1~6의 탄소 원자수를 갖는 환상 또는 비환상의 알킬기이다; M은 Si, Ge, Sn, Ti, Zr 및 Hf로 이루어지는 군에서 선택된다; x는 1~3의 정수이며; n은 1~4의 정수이다. 본 발명의 화합물은, 원자층 증착(ALD), 화학 기상 증착(CVD), 플라즈마 보조 ALD 및 플라즈마 보조 CVD와 같은 화학 증착 프로세스에 있어서, 전구체로서 유용하다. 또한, SiO 필름과 같은 금속 산화물 필름의 저온 기상 증착 방법도 제공한다. x 3 4-x 1 2 4 2 n 5 6 4 5 6 7 1 1 2 1 2 4 5 6 7 3 2
Also published as:
SG11201806724YEP3414254CN109588049WO/2017/136945