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1. KR1020180098626 - 임프린트 장치 및 물품의 제조 방법

Office Republic of Korea
Application Number 1020187021645
Application Date 11.01.2017
Publication Number 1020180098626
Publication Date 04.09.2018
Publication Kind A
IPC
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
02
by mechanical means, e.g. pressing
04
using rollers or endless belts
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G03F 7/00
B29C 59/04
G03F 7/20
H01L 21/027
Applicants 캐논 가부시끼가이샤
Inventors 사카모토 에이지
Agents 장수길
이중희
Priority Data JP-P-2016-018746 03.02.2016 JP
2016240689 12.12.2016 JP
Title
(KO) 임프린트 장치 및 물품의 제조 방법
Abstract
(KO)
형을 이용하여 기판(5)에 패턴을 형성하는 임프린트 장치(1)는, 기판(5)을 보유 지지하여 이동 가능한 기판 스테이지(6)와, 기판 스테이지(6) 위의 기판(5)을 보유 지지하는 영역의 외주부에 배치되고, 구멍을 갖는 판 부재인 다공판(10)과, 기판 스테이지(6)의 상면 근방의 이물(90)이 임프린트 공간에 진입하는 것을 방지하기 위하여 구멍을 통하여 기판 스테이지(6) 상의 공간의 기체를 흡인 또는 기판 스테이지(6) 상의 공간에 대한 기체의 방출을 제어하는 제어부를 갖는다.

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