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1. (KR1020180105665) 구조체

Office : Republic of Korea
Application Number: 1020187022599 Application Date: 23.01.2017
Publication Number: 1020180105665 Publication Date: 28.09.2018
Publication Kind : A
Prior PCT appl.: Application Number: ; Publication Number:WO2017130888 Click to see the data
IPC:
G03F 7/00
B29C 33/38
B29C 33/42
B29C 59/02
G03F 7/11
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33
Moulds or cores; Details thereof or accessories therefor
38
characterised by the material or the manufacturing process
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
33
Moulds or cores; Details thereof or accessories therefor
42
characterised by the shape of the moulding surface, e.g. ribs, grooves
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
02
by mechanical means, e.g. pressing
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
11
having cover layers or intermediate layers, e.g. subbing layers
Applicants: 소켄 케미칼 앤드 엔지니어링 캄파니, 리미티드
Inventors: 미야자와 유키히로
사카타 이쿠미
Agents: 특허법인우인
Priority Data: JP-P-2016-012844 26.01.2016 JP
Title: (KO) 구조체
Abstract: front page image
(KO) 미세 패턴을 갖는 구조체로서, 미세 패턴에서의 높이가 다른 영역의 높이의 차가 작은 구조를 제공한다. 본 발명에 의하면, 탄성층과 탄성층의 상측에 설치된 수지층을 갖는 구조체이며, 상기 수지층은 상기 탄성층의 반대측의 면에 미세 패턴을 구비하고, 상기 미세 패턴은 높이가 다른 복수의 영역을 구비하고 이하의 (1) 또는 (2)의 구성을 구비하는 구조체가 제공된다. (1) 상기 탄성층의 영률이 1GPa 이하이다. (2) 상기 탄성층의 영률이 상기 탄성층을 지지하는 기재의 영률보다 작다.
Also published as:
CN108475622WO/2017/130888