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1. KR1020150116845 - 기판 처리 장치

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Office
Republic of Korea
Application Number 1020157021533
Application Date 01.11.2013
Publication Number 1020150116845
Publication Date 16.10.2015
Grant Number 1018549630000
Grant Date 04.05.2018
Publication Kind B1
IPC
H01L 21/02
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
B08B 3/14
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3Cleaning by methods involving the use or presence of liquid or steam
04Cleaning involving contact with liquid
10with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity, by vibration
14Removing waste, e.g. labels, from cleaning liquid
CPC
B08B 3/14
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3Cleaning by methods involving the use or presence of liquid or steam
04Cleaning involving contact with liquid
10with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity, by vibration
14Removing waste, e.g. labels, from cleaning liquid; ; Regenerating cleaning liquids
B01D 19/0031
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
19Degasification of liquids
0031by filtration
B01D 35/02
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
35Other filtering devices; Auxiliary devices for filtration; Filter housing constructions
02Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks,
H01L 21/67017
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
H01L 21/67023
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67023for general liquid treatment, e.g. etching followed by cleaning
H01L 21/67051
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67028for cleaning followed by drying, rinsing, stripping, blasting or the like
6704for wet cleaning or washing
67051using mainly spraying means, e.g. nozzles
Applicants 가부시키가이샤 스크린 홀딩스
가부시키가이샤 스크린 홀딩스
Inventors 이시이 준이치
오카모토 고이치
이시이 준이치
오카모토 고이치
Agents 한양특허법인
한양특허법인
Priority Data 2013026282 14.02.2013 JP
Title
(KO) 기판 처리 장치
front page image
Abstract
(KO) 간단한 구성으로, 기판에 부착되는 파티클의 양을 저감시키는 기술을 제공한다. 기판 처리 장치(10)는, 처리액을 노즐(11)로부터 토출하여 기판(9)을 처리하는 장치이다. 기판 처리 장치(10)는, 공급 배관(30) 및 기포 포착부(F2)를 구비하고 있다. 공급 배관(30)의 한쪽 끝은, 파티클을 제거하는 제1 필터(F1)를 통하여, 처리액을 공급하는 처리액 공급부(20)의 탱크(21)에 접속되어 있고, 공급 배관(30)의 다른 쪽 끝은, 노즐(11)에 접속되어 있다. 기포 포착부(F2)는, 공급 배관(30)에 있어서의, 제1 필터(F1)와 노즐(11) 사이의 위치에 끼워져 삽입되어 있고, 처리액 중에 포함되는 기포(Ba1)를 포착한다. 기포 포착부(F2)에 의한 압력 손실(PL2)은, 상기 제1 필터(F1)에 의한 압력 손실(PL1)과 대략 동일하거나, 그보다도 작다.
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