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1. (JP4605014) 露光装置、露光方法、デバイスの製造方法

Office : Japan
Application Number: 2005514993T Application Date: 25.10.2004
Publication Number: 4605014 Publication Date: 05.01.2011
Grant Number: 4605014 Grant Date: 05.01.2011
Publication Kind : B2
Prior PCT appl.: Application Number:WOJP2004015796 ; Publication Number:WO2005041276 Click to see the data
IPC:
H01L 21/27
G03F 7/20
[IPC code unknown for H01L 21/27]
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
CPC:
G03F 7/70341
G03F 7/2041
Applicants: 株式会社ニコン; 東京都千代田区有楽町1丁目12番1号
Inventors: 今井 基勝
牧野内 進
Priority Data: 2003366914 28.10.2003 JP
JP2004015796 25.10.2004 WO
Title: (JA) 露光装置、露光方法、デバイスの製造方法
Abstract:
Also published as:
KR1020060128877EP1679738WO/2005/041276