Processing

Please wait...

Settings

Settings

Goto Application

1. JP2021513092 - DMDに基づく高速走査露光方法

Office
Japan
Application Number 2020534844
Application Date 23.12.2019
Publication Number 2021513092
Publication Date 20.05.2021
Publication Kind A
CPC
G03F 7/2053
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2053using a laser
G03F 7/704
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
704Scanned exposure beam, e.g. raster-, rotary- and vector scanning
G03F 7/2057
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
2057using an addressed light valve, e.g. a liquid crystal device
Applicants 合肥芯碁微電子装備股▲ふん▼有限公司
Inventors 卞 洪飛
Agents TRY国際特許業務法人
Title
(JA) DMDに基づく高速走査露光方法
Abstract
(JA)

DMDに基づく高速走査露光方法において、レーザー(11)から発せられた光がDMD(12)を照射して、DMD(12)で反射されてから対物レンズ(13)に入射し、精密ステージ(15)上の基板(14)上の感光材料で結像するように制御するステップS100と、精密ステージ(15)が第1の方向に沿って均一な速度で移動しながら、設定された走査ステップに従ってパルス信号を等距離で発生させてから、第1の方向に垂直な第2の方向にステップ移動し、または、移動しないように制御するステップS200と、DMD(12)により、パルス信号が検出されてパターンが更新されてから次のパルス信号が検出されるまで、レーザーから発せられた光を対物レンズ(13)の外に反射させるようにDMDマイクロミラーの偏向角度を調整するステップS300と、を含む。

Also published as
EP19888237.5