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PROBLEM TO BE SOLVED: To reduce particles in a substrate processor provided with a rotation mechanism.
SOLUTION: The substrate processor is provided with a processing container 1 dividing a processing space for processing a substrate to be processed W, a substrate supporting body 12 supporting the substrate to be processed W in the processing container, a movable member 11 which is directly or indirectly connected to the substrate supporting body 12, and a rotor 10 rotating the substrate supporting body 12 through the movable member 11 by rotation while it abuts on the movable member 11. The movable member 11 and the rotor 10 are formed of ceramic materials whose values of fracture toughness defined in JIS R1607, and/or whose values of three point flexural strength defined in JIS R1601 differ.
COPYRIGHT: (C)2006,JPO&NCIPI
【課題】回転機構を備えた基板処理装置において、パーティクルの低減を図る。【解決手段】基板処理装置は、被処理基板Wを処理するための処理空間を区画する処理容器1と、処理容器内において被処理基板Wを支持する基板支持体12と、基板支持体12に直接もしくは間接的に連結された可動部材11と、可動部材11に当接しつつ回転することにより、該可動部材11を介して基板支持体12を回転させる回転体10と、を備えており、可動部材11と回転体10は、JIS R1607に規定する破壊靱性の値および/またはJIS R1601に規定する3点曲げ強度の値が異なるセラミックス材料により構成される。【選択図】図1