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1. (JP2008545262) 排気ガスの処理方法

Office : Japan
Application Number: 2008518949 Application Date: 23.06.2006
Publication Number: 2008545262 Publication Date: 11.12.2008
Publication Kind : A
IPC:
B01D 53/46
H01L 21/205
B01D 53/68
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
46
Removing components of defined structure
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
20
Deposition of semiconductor materials on a substrate, e.g. epitaxial growth
205
using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
46
Removing components of defined structure
68
Halogens or halogen compounds
CPC:
C23C 16/4412
C23C 16/4408
Y02C 20/30
Applicants: エドワーズ リミテッド
Inventors: ショー クリストファー ジョン
ワイルダーズ マイケル アラン エリック
ベイリー クロストファー マーク
Agents: 熊倉 禎男
大塚 文昭
宍戸 嘉一
弟子丸 健
井野 砂里
Priority Data: 0513867.2 06.07.2005 GB
Title: (JA) 排気ガスの処理方法
Abstract: front page image
(JA)

【解決手段】処理チャンバ(12)からガスの形態である爆発材料の流体流れを輸送するフォアライン(foreline)(10)の内部において、固形爆発材料の蓄積を阻止する方法であって、爆発材料と反応させて非爆発材料を形成するために、源(16)から流体流れに酸化剤を供給し、酸化剤の処理チャンバ内への移動を阻止する。
【選択図】図1


Also published as:
KR1020080025724WO/2007/003882