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1. IN7212/CHENP/2008 - COLD-PRESSED SPUTTER TARGET

Office India
Application Number 7212/CHENP/2008
Application Date 30.12.2008
Publication Number 7212/CHENP/2008
Publication Date 03.04.2009
Publication Kind A
IPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
Applicants W.C.HERAEUS GMBH
Inventors SCHULTHEIS, MARKUS,
WEIGERT, MARTIN,
Priority Data 102006026005.8 01.06.2006 DE
Title
(EN) COLD-PRESSED SPUTTER TARGET
Abstract
(EN)
The invention relates to a sputter target comprising a sputter material that is made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. According to the invention, the components are compacted by means of an isostatic or uneasily cold-pressing process.