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1. EP3231003 - A DEVICE HAVING TWO END BLOCKS, AN ASSEMBLY AND A SPUTTER SYSTEM COMPRISING SAME, AND A METHOD OF PROVIDING RF POWER TO A TARGET ASSEMBLY USING SAID DEVICE OR ASSEMBLY

Office European Patent Office
Application Number 15807874
Application Date 08.12.2015
Publication Number 3231003
Publication Date 18.10.2017
Publication Kind B1
IPC
H01J 37/32
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
H01J 37/34
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
34operating with cathodic sputtering
CPC
H01J 37/32082
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
H01J 37/3405
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3402using supplementary magnetic fields
3405Magnetron sputtering
H01J 37/3444
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3444Associated circuits
H01J 37/347
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3464Operating strategies
347Thickness uniformity of coated layers or desired profile of target erosion
H01J 37/32
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
H01J 37/3435
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3435Target holders (includes backing plates and endblocks)
Applicants SOLERAS ADVANCED COATINGS BV
Inventors DE BOSSCHER WILMERT
VAN DE PUTTE IVAN
Designated States
Priority Data 14196851 08.12.2014 EP
Title
(DE) VORRICHTUNG MIT ZWEI ENDBLÖCKEN, ANORDNUNG UND SPUTTERSYSTEM DAMIT UND VERFAHREN ZUR BEREITSTELLUNG VON HF-LEISTUNG IN EINEM TARGETROHR MIT DIESER VORRICHTUNG ODER ANORDNUNG
(EN) A DEVICE HAVING TWO END BLOCKS, AN ASSEMBLY AND A SPUTTER SYSTEM COMPRISING SAME, AND A METHOD OF PROVIDING RF POWER TO A TARGET ASSEMBLY USING SAID DEVICE OR ASSEMBLY
(FR) DISPOSITIF POSSÉDANT DEUX BLOCS D'EXTRÉMITÉ, ENSEMBLE ET SYSTÈME DE PULVÉRISATION COMPRENANT CELUI-CI ET PROCÉDÉ DE FOURNITURE DE PUISSANCE RF VERS UN TUBE CIBLE À L'AIDE DE CE DISPOSITIF OU ENSEMBLE
Abstract
(EN)
A device (602) for use in a sputter system(600), comprising at least a first end block (631) and a second end block (632)positioned at opposite sides of the sputter system. The device is adapted such that a target assembly comprising at least one target tube or sputter magnetron, when mounted on the first and second end blocks (631, 632), may be powered actively with RF power at both sides of the assembly, and such that the target assembly, when mounted, is not actively powered continuously with RF power simultaneously at both extremities of a target tube or sputter magnetron. An assembly (601) comprising said device and a control unit for controlling powering of opposite sides of the target assembly by RF power such that the target assembly, when mounted, is not actively powered continuously with RF power simultaneously at both extremities of a target tube or sputter magnetron is also provided, as well as a method for applying RF power to impedance target assembly.

(FR)
L'invention concerne un dispositif (602) destiné à être utilisé dans un système de pulvérisation cathodique (600), comprenant au moins un premier bloc d'extrémité (631) et un second bloc d'extrémité (632) positionnés au niveau de côtés se faisant face du système de pulvérisation cathodique. Le dispositif est conçu de sorte qu'un ensemble cible comprenant au moins un tube cible ou un magnétron de pulvérisation cathodique, lorsqu'il est monté sur les premier et second blocs d'extrémité (631, 632), puisse être alimenté de façon active avec une puissance radioélectrique au niveau des deux côtés de l'ensemble, et de sorte que l'ensemble cible, lorsqu'il est monté, ne soit pas alimenté de façon active en continu avec une puissance radioélectrique simultanément au niveau des deux extrémités d'un tube cible ou d'un magnétron de pulvérisation cathodique. L'invention concerne également un ensemble (601) comprenant ledit dispositif et une unité de commande permettant de commander l'alimentation de côtés se faisant face de l'ensemble cible par la puissance radioélectrique de sorte que l'ensemble cible, lorsqu'il est monté, ne soit pas alimenté de façon active en continu avec une puissance radioélectrique simultanément au niveau des deux extrémités d'un tube cible ou d'un magnétron de pulvérisation cathodique, ainsi qu'un procédé permettant d'appliquer une puissance radioélectrique à un ensemble cible d'impédance.