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1. EP2024529 - COLD-PRESSED SPUTTER TARGETS

Office European Patent Office
Application Number 07725645
Application Date 30.05.2007
Publication Number 2024529
Publication Date 18.02.2009
Publication Kind A1
IPC
C23C 14/34
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
CPC
C23C 14/3414
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Applicants HERAEUS GMBH W C
Inventors SCHULTHEIS MARKUS
WEIGERT MARTIN
Designated States
Title
(DE) KALTGEPRESSTE SPUTTERTARGETS
(EN) COLD-PRESSED SPUTTER TARGETS
(FR) CIBLES DE PULVÉRISATION CATHODIQUE COMPACTÉES À FROID
Abstract
(DE)
Die Erfindung betrifft ein Sputtertarget mit einem Sputtermaterial aus einer Legierung oder Materialmischung aus mindestens zwei Komponenten, wobei die beiden Komponenten im thermodynamischen Ungleichgewicht vorliegen und besteht darin, dass die Komponenten durch ein isostatisches oder uniaxiales Kalt-Press-Verfahren kompaktiert sind.

(EN)
The invention relates to a sputter target comprising a sputter material that is made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. According to the invention, the components are compacted by means of an isostatic or uniaxial cold-pressing process.

(FR)
L'invention concerne une cible de pulvérisation comprenant une matière de pulvérisation en alliage ou en mélange de matières comportant au moins deux composants en déséquilibre thermodynamique. L'invention est caractérisée en ce que les composants sont compactés par un procédé de compactage à froid isostatique ou uniaxial.