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1. (EP1679738) EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD

Office : European Patent Office
Application Number: 04792927 Application Date: 25.10.2004
Publication Number: 1679738 Publication Date: 12.07.2006
Publication Kind : A4
Designated States: AT,BE,BG,CH,CY,CZ,DE,DK,EE,ES,FI,FR,GB,GR,HU,IE,IT,LI,LU,MC,NL,PL,PT,RO,SE,SI,SK,TR
Prior PCT appl.: Application Number:JP2004015796 ; Publication Number: Click to see the data
IPC:
H01L 21/027
G03F 7/20
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
CPC:
G03F 7/70341
Applicants: NIKON CORP
Inventors: IMAI MOTOKATSU
MAKINOUCHI SUSUMU
Priority Data: 2003366914 28.10.2003 JP
2004015796 25.10.2004 JP
Title: (DE) BELICHTUNGSVORRICHTUNG, BELICHTUNGSVERFAHREN UND BAUELEMENTEHERSTELLUNGSVERFAHREN
(EN) EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD
(FR) APPAREIL D'EXPOSITION, PROCEDE D'EXPOSITION ET PROCEDE POUR PRODUIRE LE DISPOSITIF
Abstract: front page image
(EN) An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.
(FR) L'invention concerne un appareil d'exposition formant une région d'immersion liquide par alimentation d'un liquide en partie sur un substrat et formant un motif prédéterminé sur le substrat à travers le liquide. L'appareil est caractérisé en ce qu'une région d'immersion de liquide préliminaire capable de maintenir sur le substrat une partie du liquide est formée sur une périphérie extérieure de la région d'immersion liquide. Le liquide placé entre la face inférieure d'un système optique de projection et la surface du substrat est conçue pour ne pas être séparée de la face inférieure du système optique de projection, lorsque le système optique de projection et le substrat bougent sensiblement.
Also published as:
KR1020060128877JP4605014WO/2005/041276