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1. CN102484350 - 光源的主动光谱控制

Office China
Application Number 201080038324.4
Application Date 24.08.2010
Publication Number 102484350
Publication Date 30.05.2012
Grant Number 102484350
Grant Date 23.07.2014
Publication Kind B
IPC
H01S 3/13
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
3Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
13Stabilisation of laser output parameters, e.g. frequency, amplitude
CPC
G03F 7/70575
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
7055Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
70575Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength, matching of optical components to wavelength
G03F 7/70525
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
70491Information management and control, including software
70525Controlling normal operating mode, e.g. matching different apparatus, remote control, prediction of failure
Applicants 西默股份有限公司
Inventors 成乐根
I·B·拉洛维奇
N·R·法勒
R·J·拉法克
J·J·班迪克
Agents 上海专利商标事务所有限公司 31100
Priority Data 12860288 20.08.2010 US
61/236,848 25.08.2009 US
Title
(ZH) 光源的主动光谱控制
Abstract
(ZH)

一种控制光束的光谱性质的方法,所述方法包括:引导光束至被配置在晶片上创建图案的光刻曝光装置;接收表示光束的光谱性质的信息;接收表示光刻曝光装置的光学成像条件的信息;基于所接收的光谱性质信息和所接收的光学成像条件信息估计光束的特征值;确定所估计的光束特征值是否与目标光束特征值匹配;以及如果确定所估计的光束特性值与目标光束特性值不匹配,则调整所述光束的光谱性质。