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1. CN101887032 - Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination

Office China
Application Number 201010211685.6
Application Date 07.07.2006
Publication Number 101887032
Publication Date 17.11.2010
Grant Number 101887032
Grant Date 16.05.2012
Publication Kind B
IPC
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
84
Systems specially adapted for particular applications
88
Investigating the presence of flaws, defects or contamination
95
characterised by the material or shape of the object to be examined
G PHYSICS
01
MEASURING; TESTING
N
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
21
Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light
17
Systems in which incident light is modified in accordance with the properties of the material investigated
47
Scattering, i.e. diffuse reflection
G01N 21/95
G01N 21/47
CPC
G01N 21/9501
G01N 21/47
G01N 2021/8822
G02B 13/22
Applicants Electro Scient Ind Inc.
伊雷克托科学工业股份有限公司
Inventors Baldwin Leo
里欧·鲍德温
Emery Joseph J.
约瑟·J.·伊莫瑞
Agents zeng xianwei
北京银龙知识产权代理有限公司 11243
Priority Data 60/697,904 08.07.2005 US
Title
(EN) Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
(ZH) 远心轴上暗场照明所实施的光学系统的优化使用及性能
Abstract
(EN)
Systems and methods are provided for imaging a planar specular object (102) such as a semiconductor wafer. In one embodiment, an imaging system (100) for imaging a defect on a planar specular object (102) includes a telecentric lens (110) having a sufficiently aspherical surface such that the telecentric lens (110) is substantially corrected for an optical aberration. The imaging system (100) also includes a telecentric stop (116) including an aperture therein to block light reflected from the planar specular object (102) while allowing light reflected from the defect to pass through the aperture. The imaging system (100) further includes a lens group (108) having a system stop positioned between the telecentric stop (116) and the lens group (108). The lens group (108) is substantially corrected for the optical aberration independent of the telecentric lens (110).

(ZH)

本发明提供一种系统及方法,通过本发明提出以成像平面镜状物体(102),诸如:半导体晶圆。于实施例中,用于成像于平面镜状物体(102)的缺陷的一种成像系统(100)包括远心透镜(110),其具有充分非球面表面,使远心透镜实质修正光学像差。成像系统(100)还包括远心光圈(116),于其包括孔径,以阻断自平面镜状物体(102)所反射的光线而允许自缺陷所反射的光线为通过孔径。成像系统(100)更包括透镜群组(108),其具有定位于远心光圈(116)与透镜群组(108)之间的系统光圈。透镜群组(108)无关于远心透镜(110)而实质修正光学像差。