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1. CN101853768 - Cylindrical plasma resonant cavity

Office
China
Application Number 201010147798.4
Application Date 09.04.2010
Publication Number 101853768
Publication Date 06.10.2010
Grant Number 101853768
Grant Date 04.07.2012
Publication Kind B
IPC
H01J 37/32
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes
CPC
H01J 37/32247
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32192Microwave generated discharge
32211Means for coupling power to the plasma
32247Resonators
H05H 7/18
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
HPLASMA TECHNIQUE
7Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
14Vacuum chambers
18Cavities; Resonators
Applicants Yangtze Optical Fibre and Cable Co., Ltd.
长飞光纤光缆有限公司
Inventors Lei Gaoqing
李震宇
Li Zhenyu
卢松涛
Liu Shanpei
刘善沛
Liu Yongtao
龙胜亚
Long Shengya
雷高清
Lu Songtao
刘泳涛
Agents hu jianbeng
湖北武汉永嘉专利代理有限公司 42102
Title
(EN) Cylindrical plasma resonant cavity
(ZH) 一种圆柱型等离子体谐振腔
Abstract
(EN) The invention relates to a cylindrical plasma resonant cavity, which is used for a plasma chemical vapor deposition PCVD optical fiber preform processing machine tool. The cylindrical plasma resonant cavity comprises a cylindrical resonant cavity shell, wherein the two ends of the cylindrical resonant cavity shell are provided with a cutoff waveguide respectively; and a waveguide inlet is circumferentially reserved on the cylindrical resonant cavity shell. The cylindrical plasma resonant cavity is characterized in that: each of the cutoff waveguides at the two ends of the cylindrical resonant cavity shell has a movable end cover structure; a centre through hole is reserved on each cutoff waveguide with the movable end cover structure; and the inner end face of the cylindrical resonant cavity shell is provided with a protruded round platform which is matched with the cylindrical resonant cavity. The cutoff waveguides are disassembled and replaced, so the resonant cavity can be matched with glass lining tubes of different diameters, a waveguide device is better matched with the load of the resonant cavity, coupling effect is improved, the change of the load is adapted in a machining process, energy consumption is reduced and the machining application range of the cylindrical plasma resonant cavity is further broadened. The cylindrical plasma resonant cavity has the characteristics of simple structure, easy machining and manufacturing, uniform deposition, good deposition and attachment effect and improvement in the machining accuracy and efficiency of a PCVD process.
(ZH)

本发明涉及一种用于PCVD光纤预制棒加工机床的圆柱型等离子体谐振腔,包括有圆柱型谐振腔壳体,在圆柱型谐振腔壳体两端设置截止波导,在圆柱型谐振腔壳体周向开设有一波导入口,其特征在于在圆柱型谐振腔壳体两端的截止波导为活动端盖结构,所述的活动端盖结构截止波导开设有中间通孔,内端面设置凸起的圆台,与圆柱型谐振腔相配置。本发明通过拆换截止波导可使谐振腔与不同直径的玻璃衬管相匹配,使波导装置更好地与谐振腔负载匹配,提高耦合效果,以适应加工过程中负载的变化,减少能量损耗,从而提高了圆柱型等离子体谐振腔的加工适应范围;本发明结构简单,易于加工制造;沉积均匀;沉积附着效果好,提高了PCVD工艺的加工精度和效率。


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