(EN)
There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200 DEG C as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less.
(ZH)
本发明提供了形成有热射线屏蔽膜的基体部件的制备方法，包括如下步骤：混合通过使用初始原料三烷氧基硅烷或三烷氧基硅烷和四烷氧基硅烷形成的溶胶溶液与其中分散有锡掺杂氧化铟超细颗粒的溶液以制备处理剂的步骤；及将所述处理剂施用到基体部件上的步骤。在该制备方法中，处理剂具有沸点100-200℃的有机溶剂作为分散介质，通过将保持处理剂的部件与基体部件接触的方式或通过喷涂处理剂的方式进行施用，从而将要形成的膜的雾度值调整到0.5％或更低。
