PATENTSCOPE will be unavailable a few hours for maintenance reason on Tuesday 19.11.2019 at 4:00 PM CET
Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (CN101278357) System and method for inspection of micro and nanomechanical structures

Office : China
Application Number: 200680033052.2 Application Date: 13.07.2006
Publication Number: 101278357 Publication Date: 01.10.2008
Grant Number: 101278357 Grant Date: 22.02.2012
Publication Kind : B
Prior PCT appl.: Application Number:PCTES2006000405 ; Publication Number:2007006834 Click to see the data
IPC:
G12B 21/20
(Deprecated)
G PHYSICS
12
INSTRUMENT DETAILS
B
CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
21
Details of apparatus using scanning-probe techniques
20
Scanning or positioning arrangements
CPC:
G01Q 10/06
G01Q 20/02
G01Q 70/06
Applicants: Consejo Superior de Investigaciones Cientificas
康斯乔最高科学研究公司
Inventors: Tamayo De Miguel Francisco Javier
F·J·塔马约德米古尔
Mertens Johan
J·默滕斯
Calleja Goemez Montserrat
M·卡尔贾戈梅茨
Agents: huangli hang
中国专利代理(香港)有限公司 72001
中国专利代理(香港)有限公司 72001
Priority Data: 05380157.7 14.07.2005 EP
Title: (EN) System and method for inspection of micro and nanomechanical structures
(ZH) 用于对微机械及纳米机械结构进行检验的系统及方法
Abstract: front page image
(EN) The invention relates to a system for the inspection of surfaces, which is configured to detect vibration and/or relative displacement characteristics at different points of various elements (51) forming part of a mechanical structure (5), such as a micro or nanomechanical structure. According to the invention, a light beam is moved by the mechanical structure along a first path (A) in order to detect different successive reference positions (C) along the length of said path (A) and the light beam is also moved by the mechanical structure along various secondary paths (B) which are each associated with one of the aforementioned reference positions (C). In addition, the invention relates to a corresponding method and a program for performing said method.
(ZH)

本发明涉及一种用于表面检验的系统,其被设置用于探测构成机械结构(5),例如微机械结构或纳米机械结构,之一部分的多个元件(51)的不同点处的振动和/或相对位移特性。根据本发明,使光束沿第一轨迹(A)沿所述机械结构发生位移,以探测沿所述轨迹(A)长度的不同的相继参考位置(C),并使光束进一步沿多个第二轨迹(B)沿所述机械结构位移,其中每一所述第二轨迹(B)均与其中一个前述参考位置(C)相关联。此外,本发明进一步涉及一种对应方法以及一种实施该方法的程序。


Also published as:
JP2009501327US20090207404CA2626230WO/2007/006834