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1. CN113867043 - Light-emitting substrate, preparation method thereof and display device

Office
China
Application Number 202010621948.4
Application Date 30.06.2020
Publication Number 113867043
Publication Date 31.12.2021
Publication Kind A
IPC
G02F 1/13357
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements
1335Structural association of cells with optical devices, e.g. polarisers or reflectors
13357Illuminating devices
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02F 1/133603
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements; ; Manufacturing methods
1335Structural association of cells with optical devices, e.g. polarisers or reflectors
1336Illuminating devices
133602Direct backlight
133603with LEDs
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02F 1/1336
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333Constructional arrangements; ; Manufacturing methods
1335Structural association of cells with optical devices, e.g. polarisers or reflectors
1336Illuminating devices
H01L 33/62
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
33Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
48characterised by the semiconductor body packages
62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Applicants BOE TECHNOLOGY GROUP CO., LTD.
京东方科技集团股份有限公司
HEFEI XINSHENG OPTOELECTRONIC TECHNOLOGY CO., LTD.
合肥鑫晟光电科技有限公司
Inventors XIE XIAODONG
谢晓冬
HE MIN
何敏
WANG JING
王静
ZHANG TIANYU
张天宇
ZHAO XUE
赵雪
ZHONG TENGFEI
钟腾飞
Agents 北京市柳沈律师事务所 11105
Title
(EN) Light-emitting substrate, preparation method thereof and display device
(ZH) 发光基板及其制备方法、显示装置
Abstract
(EN) The invention discloses a light-emitting substrate, a preparation method thereof and a display device. The preparation method comprises the following steps: providing a substrate; forming a first conductive pattern on the substrate by using a first mask plate comprising a first mask pattern; forming a first insulating layer on the first conductive pattern by using a second mask plate including a second mask pattern to form a first via hole and a second via hole exposing a partial region of the first conductive pattern; forming a second conductive pattern on the first insulating layer by using a first mask plate, wherein the second conductive pattern is electrically connected with the first conductive pattern through the first via hole and the second via hole; forming a second insulating layer on the second conductive pattern by using a second mask plate so as to form a third via hole and a fourth via hole which expose a partial region of the second conductive pattern; and forming a third conductive pattern on the second insulating layer using a third mask plate including a third mask pattern, the third conductive pattern being electrically connected to the second conductive pattern through a third via hole. The preparation method can reduce the preparation cost.
(ZH) 一种发光基板及其制备方法、显示装置,该制备方法包括:提供衬底基板;利用包括第一掩模图案的第一掩模板在衬底基板上形成第一导电图案;利用包括第二掩模图案的第二掩模板在第一导电图案上形成第一绝缘层,以形成暴露第一导电图案的部分区域的第一过孔和第二过孔;利用第一掩模板在第一绝缘层上形成第二导电图案,第二导电图案通过第一过孔和第二过孔与第一导电图案电连接;利用第二掩模板在第二导电图案上形成第二绝缘层,以形成暴露第二导电图案的部分区域的第三过孔和第四过孔;以及利用包括第三掩模图案的第三掩模板在第二绝缘层上形成第三导电图案,第三导电图案通过第三过孔与第二导电图案电连接。该制备方法可以降低制备成本。
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