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1. CN109656104 - Substrate exposure method and device

Office
China
Application Number 201811605204.2
Application Date 26.12.2018
Publication Number 109656104
Publication Date 19.04.2019
Grant Number 109656104
Grant Date 16.03.2021
Publication Kind B
IPC
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G02F 1/13
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour
13based on liquid crystals, e.g. single liquid crystal display cells
CPC
G02F 1/1303
GPHYSICS
02OPTICS
FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01for the control of the intensity, phase, polarisation or colour 
13based on liquid crystals, e.g. single liquid crystal display cells
1303Apparatus specially adapted to the manufacture of LCDs
G03F 7/70733
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Applicants SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
深圳市华星光电半导体显示技术有限公司
Inventors ZHANG YUANFENG
张源锋
Agents 深圳翼盛智成知识产权事务所(普通合伙) 44300
Title
(EN) Substrate exposure method and device
(ZH) 一种基板曝光方法及装置
Abstract
(EN)
The present invention relates to a substrate exposure method and device. The method comprises steps of: receiving a first target substrate and a second target substrate in a first preset splicing direction on a buffer bench; transmitting the first target substrate to a first exposure machine for carrying out first-time exposure and using a mechanical arm to transmit the first target substrate subjected to the first-time exposure to an edge exposure machine for carrying out second-time exposure; and transmitting the second target substrate to the second exposure machine for carrying out the first-time exposure, then transmitting the second target substrate subjected to the first-time exposure to the buffer bench, and controlling the buffer bench to rotate so as to allow the second target substrate to have a target splicing direction, wherein the target splicing direction and the preset splicing direction are opposite to each other so that the first target substrate and the second targetsubstrate can enter the next process at the same splicing angle, thereby reducing the adjustment time of the angle during splicing of a downstream device and improving productivity.

(ZH)
本发明涉及一种基板曝光方法及装置,包括:在缓存台以第一预设接片方向接收第一目标基板和第二目标基板;将所述第一目标基板传送至第一曝光机进行第一次曝光,之后利用机械手臂将第一次曝光后的所述第一目标基板传送至边缘曝光机进行第二次曝光;将第二目标基板传送至第二曝光机进行第一次曝光,之后将第一次曝光后的所述第二目标基板传送至所述缓存台,并控制所述缓存台旋转,以使所述第二目标基板具有目标接片方向,所述目标接片方向和所述第一预设接片方向互为反向,从而使得第一目标基板和第二目标基板能够以相同的接片角度进入到下个制程当中,减少下游设备接片时对角度的调整时间,提高生产效率。

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