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1. (CN108684200) LAMINATED FILM

Office : China
Application Number: 201780008634.3 Application Date: 27.01.2017
Publication Number: 108684200 Publication Date: 19.10.2018
Publication Kind : A
Prior PCT appl.: Application Number:PCTJP2017003047 ; Publication Number: Click to see the data
IPC:
B32B 9/00
B32B 9/04
C23C 14/08
H01L 31/048
H01L 51/50
H05B 33/02
H05B 33/04
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
9
Layered products essentially comprising a particular substance not covered by groups B32B11/-B32B29/137
04
comprising such substance as the main or only constituent of a layer, next to another layer of a specific substance
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
08
Oxides
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31
Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
04
adapted as conversion devices
042
including a panel or array of photoelectric cells, e.g. solar cells
048
encapsulated or with housing
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
02
Details
04
Sealing arrangements
Applicants: NITTO DENKO CORPORATION
日东电工株式会社
Inventors: MIYAMOTO KODAI
宫本幸大
NASHIKI TOMOTAKE
梨木智刚
Agents: 北京林达刘知识产权代理事务所(普通合伙) 11277
北京林达刘知识产权代理事务所(普通合伙) 11277
Priority Data: 2016-016525 29.01.2016 JP
Title: (EN) LAMINATED FILM
(ZH) 层叠薄膜
Abstract: front page image
(EN) Provided is a laminated film that has an excellent moisture permeability and gas barrier properties, and has an excellent chemical resistance, transparency, flexibility, and heat resistance. A laminated film of the invention has, in the following order: a substrate; a first oxide layer containing ZnO, Al, and SiO2; and a second oxide layer formed from SiO2. In an embodiment of the invention, the thickness of the first oxide layer is 10nm-100nm, and the thickness of the second oxide layer is 10nm-100nm. In an embodiment of the invention, the laminated film has a moisture permeability not exceeding 3.0x10-2g/m2/24hr and a total visible light transmittance of at least 84%.
(ZH) 提供具有优异的透湿性及阻气性、并且具有优异的耐化学药品性、透明性、弯曲性及耐热性的层叠薄膜。本发明的层叠薄膜依次具有:基材;包含ZnO、Al及SiO2的第1氧化物层;以及由SiO2构成的第2氧化物层。1个实施方式中,第1氧化物层的厚度为10nm~100nm,第2氧化物层的厚度为10nm~100nm。1个实施方式中,层叠薄膜的透湿度为3.0×10‑2g/m2/24hr以下、可见光的总透光率为84%以上。
Also published as:
KR1020180111818WO/2017/131198