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1. (CN108603282) CYLINDRICAL TARGET PRODUCTION METHOD AND CYLINDRICAL TARGET

Office : China
Application Number: 201780009419.5 Application Date: 02.02.2017
Publication Number: 108603282 Publication Date: 28.09.2018
Publication Kind : A
Prior PCT appl.: Application Number:PCTJP2017003710 ; Publication Number: Click to see the data
IPC:
C23C 14/34
G01B 21/30
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
G PHYSICS
01
MEASURING; TESTING
B
MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
21
Measuring arrangements or details thereof in so far as they are not adapted to particular types of measuring means of the other groups of this subclass
30
for measuring roughness or irregularity of surfaces
CPC:
G01B 5/28
C23C 14/3407
C23C 14/3414
G01B 5/285
Applicants: SUMITOMO CHEMICAL CO
住友化学株式会社
Inventors: SHIRAISHI MIZUKI
白石瑞树
SUGAWARA TAKUTO
菅原琢人
NISHIOKA KOJI
西冈宏司
FUJITA MASAHIRO
藤田昌宏
Agents: 北京市金杜律师事务所 11256
北京市金杜律师事务所 11256
Priority Data: 2016-021212 05.02.2016 JP
Title: (EN) CYLINDRICAL TARGET PRODUCTION METHOD AND CYLINDRICAL TARGET
(ZH) 圆筒型靶的制造方法及圆筒型靶
Abstract: front page image
(EN) To provide a method for producing a cylindrical target substantially free from lengthwise distortion. This cylindrical target production method comprises steps of: processing a target material into acylindrical shape; forming an adapter for attachment to a sputtering device on the processed cylindrical target material; and measuring the straightness of the target material with the adapter in thelengthwise direction of the appearance to determine if the straightness of the target material with the adapter is within a preset range.
(ZH) 本发明的课题在于提供制造在长度方向上几乎没有变形的圆筒型靶的方法。本发明涉及的圆筒型靶的制造方法包括下述工序:将靶材料加工成圆筒形状的工序;在已被加工成圆筒形状的靶材料上设置用于安装至溅射装置的接合件的工序;和为了对具有接合件的靶材料的直线度是否在预先规定的范围内进行确认,而对具有接合件的靶材料的外观的长度方向上的直线度进行测定的工序。
Also published as:
KR1020180103173US20190041183KR1020190042103WO/2017/135349