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1. (CN104204954) 微粒污染物测量方法和装置

Office : China
Application Number: 201380018477.6 Application Date: 28.03.2013
Publication Number: 104204954 Publication Date: 10.12.2014
Grant Number: 104204954 Grant Date: 11.05.2016
Publication Kind : B
Prior PCT appl.: Application Number:PCTEP2013056794 ; Publication Number: Click to see the data
IPC:
G03F 7/20
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
[IPC code unknown for ERROR IPC code incorrect: empty]
CPC:
G01N 21/94
B32B 37/24
B32B 38/10
B32B2037/243
G01N 21/47
G01N 21/956
G01N2001/028
G01N2001/2833
G01N2201/06113
G01N2201/105
G03F 1/82
G03F 7/7085
G03F 7/70908
Applicants: ASML荷兰有限公司
荷兰国家应用科学研究院
Inventors: A·德乔恩
J·范德东克
Agents: 中科专利商标代理有限责任公司 11021
Priority Data: 61/619,209 02.04.2012 US
Title: (ZH) 微粒污染物测量方法和装置
Abstract: front page image
(ZH)

本发明公开一种微粒污染物测量方法和设备。该方法例如包括:将聚氨酯弹性体(2)的测量表面(5)压靠待测的表面(7);从该表面移除聚氨酯弹性体而不留下残余物;随后,使用光学设备(11)检测已经通过聚氨酯弹性体从该表面移除并且已经附着至聚氨酯弹性体的微粒(8)。


Also published as:
EP2834709US20150055127KR1020150013483JP6282260JP2015517101WO/2013/149961