Processing

Please wait...

Settings

Settings

Goto Application

1. AU1992015540 - Copper ion flotation with cationic reagents

Office
Australia
Application Number 15540/92
Application Date 07.04.1992
Publication Number 1992015540
Publication Date 06.01.1994
Publication Kind A
IPC
C22B 3/44
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
BPRODUCTION OR REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
3Extraction of metal compounds from ores or concentrates by wet processes
20Treatment or purification of solutions, e.g. obtained by leaching
44by chemical processes
C22B 3/22
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
BPRODUCTION OR REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
3Extraction of metal compounds from ores or concentrates by wet processes
20Treatment or purification of solutions, e.g. obtained by leaching
22by physical processes, e.g. by filtration, by magnetic means
C22B 15/00
CCHEMISTRY; METALLURGY
22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
BPRODUCTION OR REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
15Obtaining copper
CPC
Y02P 10/20
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
10Technologies related to metal processing
20Recycling
Applicants Broken Hill Proprietary Company Limited, The
Inventors Engel, Malcolm David
Moxon, Neville Thomas
Nicol, Stuart Kenneth
Priority Data PK5494 08.04.1991 AU
Title
(EN) Copper ion flotation with cationic reagents
Abstract
(EN) A method for ion flotation of copper ions uses as the flotation reagent a cationic surfactant of formula (I), wherein R1 is a C10-C18 alkyl group, R3 is a lower alkyl group, or benzene ring optionally substituted with one or more lower alkyl groups, and R2 and R4 are lower alkyl groups; or R1, R2 and R4 are methyl groups; R3 is a benzene ring substituted with a C10-C18 alkoxy group; and X is a halogen atom.
Related patent documents