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1. WO2020140859 - PHOTOETCHING PROJECTIVE OBJECTIVE

Publication Number WO/2020/140859
Publication Date 09.07.2020
International Application No. PCT/CN2019/129760
International Filing Date 30.12.2019
IPC
G02B 13/18 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
18with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
G03F 7/20 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 13/00
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
G02B 13/0045
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
001Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
0015characterised by the lens design
002having at least one aspherical surface
0045having five or more lenses
G02B 13/18
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
18with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
G03F 7/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
G03F 7/70241
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70241Optical aspects of refractive systems
Applicants
  • 上海微电子装备(集团)股份有限公司 SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD. [CN]/[CN]
Inventors
  • 郭银章 GUO, Yinzhang
Agents
  • 北京品源专利代理有限公司 BEYOND ATTORNEYS AT LAW
Priority Data
201811648652.030.12.2018CN
Publication Language Chinese (ZH)
Filing Language Chinese (ZH)
Designated States
Title
(EN) PHOTOETCHING PROJECTIVE OBJECTIVE
(FR) OBJECTIF DE PROJECTION DE PHOTOGRAVURE
(ZH) 光刻投影物镜
Abstract
(EN)
A photoetching projective objective, comprising a first lens group (LG1), a second lens group (LG2), a third lens group (LG3), a fourth lens group (LG4), and a fifth lens group (LG5) that are sequentially arranged in an optical axis, wherein the first lens group (LG1) and the third lens group (LG3) both have a negative light focal degree; the second lens group (LG2) and the fourth lens group (LG4) both have a positive light focal degree; the light focal degree of the fifth lens group (LG5) is 0; the sum of the light focal degrees of the first lens group (LG1), the second lens group (LG2), the third lens group (LG3), the fourth lens group (LG4), and the fifth lens group (LG5) is 0. The photoetching projective objective further comprises an aperture slot (AS); the first lens group (LG1), the third lens group (LG3), and the fourth lens group (LG4) all have an aspherical lens, and one aspherical lens comprises one aspheric surface; and the number of aspherical lenses is greater than or equal to 4 and less than or equal to 8.
(FR)
Objectif de projection de photogravure comprenant un premier groupe de lentilles (LG1), un deuxième groupe de lentilles (LG2), un troisième groupe de lentilles (LG3), un quatrième groupe de lentilles (LG4) et un cinquième groupe de lentilles (LG5) agencés séquentiellement dans un axe optique, le premier groupe de lentilles (LG1) et le troisième groupe de lentilles (LG3) ayant tous deux un degré focal de lumière négatif ; le deuxième groupe de lentilles (LG2) et le quatrième groupe de lentilles (LG4) ayant tous deux un degré focal de lumière positif ; le degré focal de lumière du cinquième groupe de lentilles (LG5) étant égal à 0 ; la somme des degrés focaux de lumière du premier groupe de lentilles (LG1), du deuxième groupe de lentilles (LG2), du troisième groupe de lentilles (LG3), du quatrième groupe de lentilles (LG4) et du cinquième groupe de lentilles (LG5) étant égal à 0. L'objectif de projection de photogravure comprend en outre une fente d'ouverture (AS) ; le premier groupe de lentilles (LG1), le troisième groupe de lentilles (LG3) et le quatrième groupe de lentilles (LG4) ayant tous une lentille asphérique, une lentille asphérique comprenant une surface asphérique ; et le nombre de lentilles asphériques est supérieur ou égal à 4 et inférieur ou égal à 8.
(ZH)
一种光刻投影物镜,包括沿光轴顺次排列的第一透镜组(LG1)、第二透镜组(LG2)、第三透镜组(LG3)、第四透镜组(LG4)和第五透镜组(LG5),第一透镜组(LG1)和第三透镜组(LG3)均具有负光焦度,第二透镜组(LG2)和第四透镜组(LG4)均具有正光焦度,第五透镜组(LG5)的光焦度为0,第一透镜组(LG1)、第二透镜组(LG2)、第三透镜组(LG3)、第四透镜组(LG4)和第五透镜组(LG5)的光焦度的和为0;光刻投影物镜还包括光阑(AS);第一透镜组(LG1)、第三透镜组(LG3)和第四透镜组(LG4)均包括非球面透镜,一个非球面透镜包括一个非球面表面;非球面透镜的数量大于或等于4且小于或等于8。
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